Vertically aligned boron nanowires in self‐assembled large‐scale arrays with excellent uniformity and high density have been fabricated using radio‐frequency magnetron sputtering of boron and B2O3 powder onto various substrates. The nanowires thus produced are several tens of micrometers long and 20–80 nm wide, with typically platform‐shaped tips (see Figure for a high‐magnification SEM image).

Well-aligned boron nanowire arrays were grown vertically on silicon substrates over areas up to several tens of square centimeters using radio-frequency magnetron sputtering of highly pure boron. During growth and self-assembly of boron nanowire arrays, no template or catalyst was needed. The morphology, structure, and composition of the self-organized boron nanowires were characterized in detail using scanning electron microscopy, transmission electron microscopy, and electron energy-loss spectroscopy. Our results might provide insight into the controllable formation of a wide variety of ordered nanostructures with advanced properties.

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Highly ordered boron nanowire multiple nanojunctions (see Figure) with unilateral feather‐like morphology have been created via a simple magnetron sputtering method. These T‐ and Y‐type nanojunctions stand freely in line to form uniform and well‐oriented arrays on the substrate surface over areas of up to several tens of square centimeters.