The current density distribution in the final spot of an electron beam lithography system can be judged from beam diameter measurements performed by means of a knife edge method or recording beam crossover images with conventional lithographic media. Electron beam induced deposition allows to record traces of the current density distribution of the primary beam only, with very small contributions of secondary electrons and x rays. The readout of the focus and stigmation status is obtained by measuring the three-dimensional appearance of the deposit with a scanning probe microscope. To be able to find the few deposits after transferring the sample to the scanning probe microscope, a ‘‘spotter’’ chip was developed, which supports optical coarse positioning and can be easily scanned by probe microscopes. By scanning a sharp tip structure, deposited by electron beam near the center of the chip, the shape of the probing tip is imaged. This information can be used to unfold the image from the probe tip contributions. Results of beam intensity profiles obtained with this new method using a scanning force microscope are presented.

Surface characterization of new unused PTFE, PFA and PVDF labware has been carried out by light microscopy, scanning electron microscopy, profilometry and atomic force microscopy. It has been found that in spite of higher micro-roughness, PFA exhibits the lowest nano-roughness and hence seems best suited as vessel material for relatively mild pressureless chemical operations for sample preparation of ultrapure substances, as container material for storage of ultrapure liquids, and for transport of such liquids, e.g., from the producer in the chemical to the end user in the microelectronics industry. This suitability refers only to the surface quality of the investigated materials. PTFE-surfaces, due to the sintering process of production, exhibit the most unfavourable surface quality of the investigated fluorinated polymers.

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Scanning force microscopy was used to investigate the morphology and the microroughness of the dry etched surfaces of titanium masks and InP substrates. The influence of different ion beam etching procedures on the surface roughness has been studied. Since the observed surface structures were on the nanometer scale, sharp microtips with an improved geometry were used in order to obtain high lateral and vertical resolution. The tips were produced by electron-beam-induced deposition employing a field emission scanning electron microscope. Tip convolution effects were considered and, moreover, a scan artifact at steep surfaces features was revealed.