The blackening of indium-tin oxide and tin oxide thin film substrates during rf sputter deposition of yttrium oxide has been investigated to determine the precise conditions and mechanisms effecting this phenomenon. It was determined that at argon pressures below 4 microns and/or with the substrate films grounded, the yttria films deposited were oxygen deficient. The subsequent reduction of the substrate film by the more stable yttria resulted in the blackened appearance of the film. The problem was further compounded when these electrically conductive substrates were of optimum properties (sheet resistance below 20 ~/sq and light transmission greater than 80%), as these properties can be simultaneously obtained only from a high oxygen deficiency. Based on these results, sputtering conditions are described which effectively deal with the problem. * Electrochemical Society Active Member.
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