A method to calculate the location of all Bragg diffraction peaks from nanostructured thin films for arbitrary angles of incidence from just above the critical angle to transmission perpendicular to the film is reported. At grazing angles, the positions are calculated using the distorted wave Born approximation (DWBA), whereas for larger angles where the diffracted beams are transmitted though the substrate, the Born approximation (BA) is used. This method has been incorporated into simulation code (called NANOCELL) and may be used to overlay simulated spot patterns directly onto two-dimensional (2D) grazing angle of incidence small-angle X-ray scattering (GISAXS) patterns and 2D SAXS patterns. The GISAXS simulations are limited to the case where the angle of incidence is greater than the critical angle (alpha(i) > alpha(c)) and the diffraction occurs above the critical angle (alpha(f) > alpha(c)). For cases of surfactant self-assembled films, the limitations are not restrictive because, typically, the critical angle is around 0.2 degrees but the largest d spacings occur around 0.8 degrees 2theta. For these materials, one finds that the DWBA predicts that the spot positions from the transmitted main beam deviate only slightly from the BA and only for diffraction peaks close the critical angle. Additional diffraction peaks from the reflected main beam are observed in GISAXS geometry but are much less intense. Using these simulations, 2D spot patterns may be used to identify space group, identify the orientation, and quantitatively fit the lattice constants for SAXS data from any angle of incidence. Characteristic patterns for 2D GISAXS and 2D low-angle transmission SAXS patterns are generated for the most common thin film structures, and as a result, GISAXS and SAXS patterns that were previously difficult to interpret are now relatively straightforward. The simulation code (NANOCELL) is written in Mathematica and is available from the author upon request.

Nanoporous silica films with the double-gyroid structure offer tremendous technological potential for sensors and separations because of their high surface area and potentially facile transport properties. Further, metals and semiconductors with similar structure open up new opportunities for high-surfacearea electrodes, photoelectrochemical devices, photovoltaics, and thermoelectrics. Here, we report a new robust synthesis of highly ordered nanoporous silica films with the double-gyroid structure by evaporationinduced self-assembly (EISA) at room temperature and laboratory humidity using a commercially available EO 17 -PO 12 -C 14 surfactant. The continuous nanoporous films are synthesized on conducting electrodes. Electrochemical impedance spectroscopy is then used to quantitatively measure the accessible surface area of the underlying electrode via transport through the pore system. It is found that the double-gyroidstructure silica films expose a much higher fraction of the electrode than other commonly synthesized nanostructures such as 2D centered rectangular or 3D rhombohedral nanostructures. The double-gyroid nanoporous-film-coated electrodes are then used to fabricate inverse double-gyroid platinum nanostructures by electrodeposition, followed by etching to remove the silica. The structure of both the nanoporous silica films and the nanoporous platinum films (after etching) have been elucidated using high-resolution field-emission scanning electron microscopy (FESEM), comparing measured and simulated 2D grazing angle-of-incidence small-angle X-ray scattering (GISAXS) patterns, and comparing observed and simulated transmission electron microscopy (TEM) images. Both films are highly (211) oriented and described by a cubic Ia3 hd space group that has undergone uniaxial contraction perpendicular to the substrate. Upon this contraction, Ia3 hd symmetry is broken, but the films retain the double-gyroid topology. The nanoporous silica and the platinum nanowires have a characteristic wall or wire thicknesses of approximately 3 nm. This nanofabrication process opens up a facile general route for fabrication of ordered structures on the sub-5 nm length scale.

Thin films of nanoporous tin oxide with a 3D face-centered orthorhombic nanostructure have been synthesized by self-assembly that is controlled by post-coating thermal treatment under controlled humidity. In contrast to the conventional evaporation-induced self-assembly (EISA), the films here have no ordered nanostructure after dip-coating. However, the initial coatings are formed under conditions that inhibit significant hydrolysis and condensation for extended periods. This allows the use of postsynthesis thermal vapor treatments to completely control the formation of the nanostructure. With EO106-PO70-EO106 (Pluronic F127) triblock copolymer as the template, highly ordered nanostructures were generated by exposing the disordered films to a stream of water vapor at elevated temperature, which rehydrates the films and allows the formation of the thermodynamically favored phase. Further exposure to water vapor drives the condensation reaction through the elimination of HCl. The X-ray diffraction pattern from the nanostructure was indexed in the space group Fmmm as determined by analysis of 2D small-angle X-ray scattering patterns at various angles of incidence. The nanostructure is then stabilized and made nanoporous by extended controlled thermal treatments. After self-assembly and template removal, the films are thermally stable up to 600 degrees C and retain an ordered, face-centered orthorhombic nanostructure.

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The double-gyroid phase of nanoporous silica films formed by evaporation-induced self-assembly (EISA) has been shown to possess facile mass-transport properties and may be used as a robust template for the nanofabrication of metal and semiconductor nanostructures. Recently, we developed a new synthesis of double-gyroid nanoporous silica films where the aging time of the coating solution prior to EISA was the key parameter required to control the interfacial curvature that results upon self-assembly of the film. Here, we use 29Si nuclear magnetic resonance (NMR) and small-angle X-ray scattering (SAXS) to investigate the nanoscale structure of the coating solutions used to obtain double-gyroid nanoporous silica films. NMR and SAXS were carried out on the water, ethanol, silica, and poly(ethylene oxide)-b-poly(propylene oxide)-b-alkyl (EO17-PO12-C14) surfactant coating solutions as well as similar solutions that excluded either the silica or the surfactant. NMR data reveal that the silica monomers in the coating solution condense very rapidly to form rings and connected ring species. After 1 day of aging, all monomers and dimers have disappeared, and the distribution is dominated by Q2 and Q3 species, where the superscript in Qn describes the number of silicon atoms in the second coordination shell of the central silicon. Over the course of the next 9 days, the Q3 population slowly rises at the expense of the Q2 and Q3t populations. Absolute intensity SAXS measurements reveal that the size of the silica clusters increases steadily during this aging period, reaching an average radius of gyration of 9.0 A after 9 days of aging. Longer aging results in the continued growth of clusters with a mass fractal dimension of 1.8. Absolute intensity SAXS data also reveals that micelles are not present in the coating solution. At 9% volume fraction of surfactant, the coating solution is far above the aqueous critical micellar concentration. However, even a small amount of ethanol inhibits micellization. SAXS data also shows that when surfactant is present the radius of gyration is larger but increases more slowly. This indicates that there are weak associative interactions between the silica clusters and surfactant in solution that reduce the cluster-cluster growth rate. In part II of this work, we use the results discovered here to interpret the effects of aging on interfacial curvature in the nanostructured films that self-assemble from these solutions.