Elemental analysis by quadrupole mass spectrometry with direct current powered glow discharge ion source has been improved for flat Cu samples. The line ratio of analyte to Ar-related interferents can be enhanced for several orders of magnitude when ion source geometry, ion extraction system and operating parameters are optimised quasi-simultaneously. Such an extreme improvement may partially be explained by different ion energy distributions depending on their origin: matrix and analytes, working gas, residual gases. Probably it is due to a synergistic effect of several processes needing further investigation.
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