Spectroscopic ellipsometry was used to characterize the complex refractive index of chemical vapor deposition (CVD) graphene grown on copper foils and transferred to glass substrates. Two ellipsometers, with respective wavelength ranges extending into the ultraviolet and infrared (IR), have been used to characterize the CVD graphene optical functions. The optical absorption follows the same relation to the fine structure constant previously observed in the IR region, and displays the exciton-dominated absorption peak at ∼4.5 eV. The optical functions of CVD graphene show some differences when compared to published values for exfoliated graphene.

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The thickness-dependent optical properties of nickel metal and nickel monosilicide (NiSi) thin films, used for self-aligned silicidation process, were characterized using spectroscopic ellipsometry. The thickness-dependent complex dielectric function of nickel metal films is shown to be correlated with the change in Drude free electron relaxation time. The change in relaxation time can be traced to the change in grain boundary (GB) reflection coefficient and grain size. A resistivity based model was used as the complementary method to the thickness-dependent optical model to trace the change in GB reflection coefficient and grain size. After silicidation, the complex dielectric function of NiSi films exhibit non-Drude behavior due to superimposition of interband absorptions arising at lower frequencies. The Optical models of the complete film stack were refined using x-ray photoelectron spectroscopy, Rutherford backscattered spectroscopy, and x-ray reflectivity (XRR).

Formamide, in its pure state, has been used as a working solvent for layer-by-layer (LbL) polyelectrolyte self-assembly. Polystyrene sulfonate (PSS) and polyallylamine hydrochloride (PAH) polyelectrolyte films were deposited onto planar substrates and colloidal particles. Film deposition was confirmed using quartz crystal microbalance and zeta potential measurements. Formamide was used as an alternative to the water-based working solvents commonly used for LbL self-assembly. Few LbL self-assembly studies using nonaqueous solvents have been reported. Most studies performed with nonaqueous solvents have required the addition of small volumes of water to dissolve the polyelectrolytes. Conversely, the high dielectric constant of pure formamide led to the dissolution and transport of PSS and PAH. Using formamide, it is possible to deposit nanometer thick polyelectrolyte films onto water-sensitive surfaces. Formamide can be thus be used for encapsulating water sensitive hydrogen storage materials within polyelectrolyte films.

Several major electron scattering mechanisms in tungsten (W) are evaluated using a combination of first-principles density functional theory, a Non-Equilibrium Green's Function formalism, and thin film Kelvin 4-point sheet resistance measurements. The impact of grain boundary scattering is found to be roughly an order of magnitude larger than the impact of defect scattering. Ab initio simulations predict average grain boundary reflection coefficients for a number of twin grain boundaries to lie in the range r = 0.47 to r = 0.62, while experimental data can be fit to the empirical Mayadas-Schatzkes model with a comparable but slightly larger value of r = 0.69. The experimental and simulation data for grain boundary resistivity as a function of grain size show excellent agreement. These results provide crucial insights for understanding the impact of scaling of W-based contacts between active devices and back-end-of-line interconnects in next-generation semiconductor technology.

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