Optical properties of high-frequency Au gratings with a fixed period (296.6 ± 0.5 nm) and a variable modulation depth are studied using measurements of spectral and angular dependence of transmission and reflection of polarized light in order to build the dispersion curves of excited optical modes and to identify their types. It was shown that in gratings with small modulation depth only propagating surface plasmon-polaritons (SPP) modes were observed. With increasing of modulation depth, the intensity of SPP decreases and localized plasmon (LP) resonance appears, which is more intense at small incident angles, and overlaps with the SPP modes. For grating with isolated grooves (nanowires), mostly LP resonance is observed. After additional deposition of gold onto grating with isolated grooves, the intensity of the SPP mode increases again, and the LP band maximum shifts to longer wavelengths.

The increase of the sensitivity of surface plasmon resonance (SPR) refractometers was studied experimentally by forming a periodic relief in the form of a grating with submicron period on the surface of the Au-coated chip. Periodic reliefs of different depths and spatial frequency were formed on the Au film surface using interference lithography and vacuum chalcogenide photoresists. Spatial frequencies of the grating were selected close to the conditions of Bragg reflection of plasmons for the working wavelength of the SPR refractometer and the used environment (solution of glycerol in water). It was found that the degree of refractometer sensitivity enhancement and the value of the interval of environment refractive index variation, Δn, in which this enhancement is observed, depend on the depth of the grating relief. By increasing the depth of relief from 13.5 ± 2 nm to 21.0 ± 2 nm, Δn decreased from 0.009 to 0.0031, whereas sensitivity increased from 110 deg./RIU (refractive index unit) for a standard chip up to 264 and 484 deg./RIU for the nanostructured chips, respectively. Finally, it was shown that the working range of the sensor can be adjusted to the refractive index of the studied environment by changing the spatial frequency of the grating, by modification of the chip surface or by rotation of the chip.

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This study reports on the employment of the interference lithography (IL) technique, using photoresist based on the chalcogenide glass (ChG) films, for fabrication of one-dimensional (gratings) and two-dimensional (arrays) periodic plasmonic structures on the surface of glass plates. The IL technique was optimized for patterning of the Au and Al layers and formation of gratings and arrays with a spatial frequency of 2000 mm−1. Optical properties of obtained structures were studied using measurements of spectral and angular dependence of transmission and reflection of polarized light. It was shown that the spectral and angular position of the surface plasmon polariton and local surface plasmon resonance, which are observed in these samples, can be adjusted over a wide range by selecting the geometric parameters of structures and technological modes of their manufacturing.

A new approach to the formation of a 1D planar periodicity on the front of a plasmonic photodetector based on Schottky barrier is proposed. It allows forming a 1D planar periodicity with corrugation at the “metal/environment” interface by laser interference lithography using embedded chalcogenide wires, whereas the “metal/semiconductor” interface is flat that leads to reducing of surface recombination losses at Shottky barrier in contrary to the conventional technology for forming corrugated metal films on the semiconductor surface requiring chemical etching of the semiconductor substrate. In this case, the metal film interfaces are quasi-anticorrelated as opposed to correlated ones in the conventional technology. It has been theoretically predicted that the polarization sensitivity (T p/T s) strongly depends on the cross-sectional shape of chalcogenide wires and reaches a value of 8. Furthermore, it was theoretically found that the maximum sensitivity of the signal intensity on the environment refractive index is three times larger than for an equivalent structure obtained by conventional technology. Comparison of experimental data for the photocurrent in the case of two types of correlation between metal film interfaces demonstrates good agreement with numerical simulations.