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The article deals with the study of the structure and properties of electric spark coatings of AlB 12 -50 wt.% Al aluminium-matrix composite electrode material on D1 aluminium alloy. Fundamental possibility of such coatings obtaining is estimated by theoretical calculation of Palatnik's criterion (0.59). Thermal conductivity coefficient and heat capacity of the composite are calculated or determined from an experiment. Mass transfer kinetics at electric spark alloying (ESA) is studied. Considering a rather high values of the cathode mass gain, the coating applied in 6 mode (E = 2.52 J, τ = 700 µs, ALIER-52 setup) is selected for further research. The thickness (h = 380 µm), microhardness (H µ = 1.86 GPa, PMT-3 tester, P = 0.05 N) and wear at dry friction (13.7 mg/(km⋅cm 2 ), MT-68 friction machine, the pin-on-disk scheme, V = 4 m/s, P = 0.2 MPa, friction path S = 3 km) are determined for the coating.

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The influence of laser pulses on the structure and electrophysical properties of resistive thick films based on the Sn 0.9 Sb 0.1 O 2 solid solution is studied. Scanning electron microscopy, atomic force microscopy, and X-ray diffraction are used to examine the structure of resistive thick films and determine the distribution of Sn 0.9 Sb 0.1 O 2 solid solution in surface layers and across the film.Exposure of thick resistive films to nano-and microsecond laser pulses changes their currentvoltage characteristics compared to samples subjected to millisecond pulses. The current-voltage characteristics become practically linear in the range from 1 to 10-11 V, thus allowing one to determine the optimum ( = 1) operating voltage range for resistors. The temperature coefficient of resistance depends on the length and energy of pulses.

The paper studies the effect of laser processing on the structure and electrophysical properties of LaB 6 -based thick film resistors (TFR). The phases and structure of the composition are investigated. The exposure to micro-and nanosecond pulses, unlike millisecond ones, is shown to insignificantly increase the electrical resistance of the film and to aid in forming more uniform and fine TFR structure. LaB 6 -based TFRs are more resistant to long-term exposure to nanosecond laser radiation than BaB 6 -and (BaB 6 -LaB 6 )-based ones.

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