We show that high-dose ion implantation can be used to introduce rare-earth dopants for the control of precessional dynamics in magnetic thin films. Tb and Gd ions have been implanted in Ni 81 Fe 19 through Ta masks at dosages from 1 ϫ 10 14 /cm 2 to 1 ϫ 10 15 /cm 2. Effects on dynamics are found to be similar to those contributed by cosputtered Tb and Gd dopants in Ni 81 Fe 19 ͑50 nm͒. Broadband ferromagnetic resonance measurements from 0 to 18 GHz show that adjustments in damping ␣ from 0.008 to 0.040 are fully intrinsic ͑Gilbert type͒ and roughly proportional to dose. The technique enables the creation of films with spatially modulated precessional characteristics.
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