The ion-molecule reactions occurring in ionized monosilane have been studied by high-pressure mass spectrometry up to about 0.5 Torr and by tandem mass spectrometry in both 90 and 180°c onfigurations. Relative cross sections of the second-order primary ion and secondary ion reactions have been determined at relative kinetic energies of reactants near 1 eV. Rate constants of both second-and third-order primary ion reactions have also been measured. It is suggested that SÍ2H74", Si3Hg+, and Si4Hu+, whose abundance reaches 35% of the ions present, are responsible for the large yield of disilane in the radical-scavenged radiolysis.
High-pressure mass spectrometry and tandem mass spectrometry have been used to study the collision reactions of primary ions of methane with monosilane and of primary ions of monosilane with methane. All primary ions of each constituent undergo at least one ion-molecule reaction with the opposite molecule, but by far the most predominant such "cross" reaction is hydride transfer from monosilane to the primary ions of methane, producing the SiHs+ ion. Reaction cross sections and rate constants for the various processes are presented.
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