Abstract3D optical security features manufactured by multistep 3D optical laser lithography are presented. These microstructures are composed of a nonfluorescent 3D cross‐grid scaffold and fluorescent markers, realized by an acrylate‐based resist containing CdSSe‐based core–shell semiconductor quantum dots, arranged onto this scaffold at will. The readout of these 3D microstructures can be (exclusively) achieved by optical sectioning methods, for example, 3D confocal fluorescence laser scanning microscopy. As examples, structures with five different layers of markers and one emission color and two different colors, respectively, are shown. This class of deterministic 3D microstructures can be embedded into thin polymer films, can be individualized, and allows for plenty of future variations and extensions. It therefore represents an interesting avenue beyond established 2D holographic or 2D fluorescent optical security features.
Vector diffraction theory was applied to study the effect of two- and three-zone annular multi-phase plates (AMPs) on the three-dimensional point-spread-function (PSF) that results when linearly polarized light is focused using a high numerical aperture refractory lens. Conditions are identified for which a three-zone AMP generates a PSF that is axially superresolved by 19% with minimal change in the transverse profile and sufficiently small side lobes that the intensity pattern could be used for advanced photolithographic techniques, such as multi-photon 3D microfabrication, as well as multi-photon imaging. Conditions are also found in which a three-zone AMP generates a PSF that is axially elongated by 510% with only 1% change along the transverse direction. This intensity distribution could be used for sub-micron-scale laser drilling and machining.
An algorithm is reported for the design of a phase-only diffractive optical element (DOE) that reshapes a beam focused using a high numerical aperture (NA) lens. The vector diffraction integrals are used to relate the field distributions in the DOE plane and focal plane. The integrals are evaluated using the chirp-z transform and computed iteratively within the Method of Generalized Projections (MGP) to identify a solution that simultaneously satisfies the beam shaping and DOE constraints. The algorithm is applied to design a DOE that transforms a circularly apodized flat-top beam of wavelength lambda to a square irradiance pattern when focused using a 1.4-NA objective. A DOE profile is identified that generates a 50 lambda x 50 lambda square irradiance pattern having 7% uniformity error and 74.5% diffraction efficiency (fraction of focused power). The diffraction efficiency and uniformity decrease as the size of the focused profile is reduced toward the diffraction limited spot size. These observations can be understood as a manifestation of the uncertainty principle.
Kant reported [J. Mod. Optics 47, 905 (2000)] a formulation for solving the inverse problem of vector diffraction, which accurately models high-NA focusing. Here, Kant's formulation is adapted to the method of generalized projections to obtain an algorithm for designing diffractive optical elements (DOEs) that reshape the axial point-spread function (PSF). The algorithm is applied to design a binary phase-only DOE that superresolves the axial PSF with controlled increase in axial sidelobes. An 11-zone DOE is identified that axially narrows the PSF central lobe by 29% while maintaining the sidelobe intensity at or below 52% of the peak intensity. This DOE could improve the resolution achievable in several applications without significantly complicating the optical system.
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