SnO 2 thin films were deposited by radio-frequency inductively coupled plasma-enhanced chemical vapor deposition. Postplasma treatments were used to modify the microstructure of the as-deposited SnO2 thin films. Uniform nanorods with dimension of ∅7×100nm were observed in the plasma-treated films. After plasma treatments, the optimal operating temperature of the plasma-treated SnO2 thin films decreased by 80 °C, while the gas sensitivity increased eightfold. The enhanced gas sensing properties of the plasma-treated SnO2 thin film were believed to result from the large surface-to-volume ratio of the nanorods’ tiny grain size in the scale comparable to the space-charge length and its unique microstructure of SnO2 nanorods rooted in SnO2 thin films.
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