Atomic layer deposition
(ALD) was used to fabricate magnesium phosphate
thin films as a magnesium-ion conducting solid electrolyte. The deposition
was carried out at lower deposition temperatures, ranging from 125
to 300 °C. The film exhibits an amorphous nature and excellent
step coverage, even in narrow trenches with a higher aspect ratio.
The growth rate and the ionic conductivity were found to increase
with a decrease of the deposition temperature. This can be explained
by increased disordering of the phosphate matrix, giving rise to enhanced
hopping conduction of magnesium ions. The film deposited at 125 °C
showed an ionic conductivity of 1.6 × 10–7 S
cm–1 at an ambient temperature of 500 °C, with
an activation energy of 1.37 eV. These values are better than those
of the film deposited at 250 °C as well as of a sputtered film.
Our results indicate that ALD has great potential for the fabrication
of magnesium-based solid electrolyte films.
We investigated the electron-phonon coupling (EPC), in the vicinity of the Fermi level, for the surface-weighted states of Mo(112) from high resolution angle-resolved photoemission data taken parallel to the surface corrugation (i.e. 11 1 ). The surface-weighted bandwidth may be discussed in terms of electron-electron interactions, electron impurity scattering and electron-phonon coupling and exhibits a mass enhancement factor λ = 0.42, within the Debye model, determined from the experimentally derived self-energy. Gold overlayers suppress the mass enhancement of the Mo(112) surface-weighted band crossing the Fermi level at 0.54Å −1 .
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