Lithography-free black metals composed of a nano-layered stack of materials are attractive not only due to their optical properties but also by virtue of fabrication simplicity and the cost reduction of devices based on such structures. We demonstrate multi-layer black metal layered structures with engineered electromagnetic absorption in the mid-infrared (MIR) wavelength range. Characterization of thin SiO2 and Si films sandwiched between two Au layers by way of experimental electromagnetic radiation absorption and thermal radiation emission measurements as well as finite difference time domain (FDTD) numerical simulations is presented. Comparison of experimental and simulation data derived optical properties of multi-layer black metals provide guidelines for absorber/emitter structure design and potential applications. In addition, relatively simple lithography-free multi-layer structures are shown to exhibit absorber/emitter performance that is on par with what is reported in the literature for considerably more elaborate nano/micro-scale patterned metasurfaces.

Lithography-free metasurfaces composed of a nano-layered stack of materials are attractive not only due to their optical properties but also by virtue of fabrication simplicity and cost reduction of devices based on such structures. We demonstrate a multi-layer metasurface with engineered electromagnetic absorption in the mid-infrared (MIR) wavelength range. Characterization of thin SiO 2 and Si films sandwiched between two Au layers by way of experimental absorption and thermal radiation measurements as well as finite difference time domain (FDTD) numerical simulations is presented. Comparison of experimental and simulation data of optical properties of multilayer metasurfaces show guidelines for the absorber/emitter applications.

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