Using STM, we have directly confirmed the incommensurate stacking of double atomic layers of graphene and monolayer h-BN on Ni(111). The formation of a graphene layer weakens the interfacial interaction between monolayer h-BN and Ni(111), resulting in insulating h-BN layers, while a pristine monolayer h-BN on Ni(111) is metallic. The STS spectra of the double atomic layers showed a tunneling character with a band gap of 0.5 eV.
Controlling the electronic properties of functional oxide materials via external electric fields has attracted increasing attention as a key technology for next-generation electronics. For transition-metal oxides with metallic carrier densities, the electric-field effect with ionic liquid electrolytes has been widely used because of the enormous carrier doping capabilities. The gate-induced redox reactions revealed by recent investigations have, however, highlighted the complex nature of the electric-field effect. Here, we use the gate-induced conductance modulation of spinel ZnxFe3−xO4 to demonstrate the dual contributions of volatile and non-volatile field effects arising from electronic carrier doping and redox reactions. These two contributions are found to change in opposite senses depending on the Zn content x; virtual electronic and chemical field effects are observed at appropriate Zn compositions. The tuning of field-effect characteristics via composition engineering should be extremely useful for fabricating high-performance oxide field-effect devices.
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