We investigated Si-doped GaN epitaxial layers on a (0001)-sapphire substrate using a HCl vapor-phase etching technique, scanning electron microscopy, atomic force microscopy, and transmission electron microscopy. Three kinds of distinctive etch pits correspond to three different types of threading dislocations, edge, mixed, and screw types. Photoluminescence intensity increases with the decrease in the number of etch pits corresponding to mixed and screw dislocations. The number of etch pits corresponding to edge dislocations, however, did not change. We concluded, therefore, that threading dislocations having a screw-component burgers vector act as strong nonradiative centers in GaN epitaxial layers, whereas edge dislocations, which are the majority, do not act as nonradiative centers.

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Exciton localization in In x Ga 1Ϫx N was studied. At 2 K, the time-integrated photoluminescence ͑PL͒ spectrum showed a Stokes shift from the absorption shoulder and broadening at the lower photon energy side. Site-selectively excited PL measurements determined the mobility edge. The exciton relaxation processes were studied by use of time-resolved PL spectroscopy. The PL decay time increased with the decrease of the detection-photon energy, indicating the dynamical features of exciton localization. In addition, we observed localized exciton luminescence turned into stimulated emission just below the mobility edge.

High-resolution transmission electron microscopy and electron energy-loss spectroscopy (EELS) were used to study the microstructural properties of CoFeB/MgO/CoFeB magnetic tunnel junctions (MTJs) with various capping layers. Crystallization of CoFeB layers was strongly dependent on the capping materials, and was affected by B diffusion. With NiFe-cap MTJs, CoFeB crystallized from the cap interface and formed a fcc structure; on the other hand, with Ta- and Ti-cap MTJs, CoFeB crystallized from the MgO interface and formed a bcc structure. EELS analysis showed that B mainly diffused to the capping layers and rarely to the MgO layers with increasing temperature. With Ti-cap MTJs, B diffusion caused hcp-Ti crystals to form an amorphous structure and CoFeB crystallized at lower temperature.

The transport of light impurity ions is investigated following neon and nitrogen gas puffing in JET ELMy H-mode. Upon achieving consistency among various ion radiation diagnostics through numerical simulations, the experimental ion transport coefficients are compared with the predictions of neoclassical theory at different regions of the plasma. The convection dominates the transport and, in the core, the transport coefficients approach the neoclassical value.

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In order to promote the grain growth of ultrathin MgO barrier deposited on a CoFeB layer, in situ infrared (IR) heat treatment just after the deposition of MgO barrier was examined. In case that IR heat treatment was not applied, tunneling magnetoresistance (TMR) ratio of CoFeB/MgO/CoFeB magnetic tunnel junction (MTJ) was significantly decreased with decreasing resistance area (RA) product to less than 10 Ω μm2. On the other hand, TMR ratio of 206% was achieved at the RA product of 2.1 Ω μm2 when the IR heat treatment was applied. According to the cross sectional transmission electron microscope images for the samples with 0.76-nm-thick (∼4 ML) MgO barrier, the (001) oriented well crystallized structure with smooth interface was observed for the IR heated sample. Moreover, it revealed that the lateral grain size of MgO was significantly enlarged compared to that for the sample without IR heating. The improvement of TMR properties at low RA product region by the heat treatment might be due to the decrease in grain boundaries of MgO layer where the coherent tunneling of Δ1 electrons is not restricted.