All siloxane-type siloxane-polyhedral oligomeric silsesquioxane [(HSiO 3/2 ) 8 , T 8 H ] copolymers were synthesized by the dehydrogenative condensation of T 8 H with diphenylsilanediol, tetraphenyldisiloxane-1,3-diol or silanol-terminated polydimethylsiloxanes in the presence of diethylhydroxylamine followed by trimethylsilylation. Coating films were prepared by spin-coating of the coating solutions prepared from the dehydrogenative condensation products. The hardness of the coating films was evaluated by a pencil hardness test and was found to increase up to 6H with increases in the curing temperature. Silica gels were prepared by concentrating the coating solution following by pyrolysis. These silica gels showed a specific surface area 449 m 2 /g at 650• C corresponding to the formation of a silica network in response to combustion of the phenyl groups.
Polyhedral oligomeric silsesquioxane (POSS) polymers were synthesized by the dehydrogenative condensation of (HSiO 3/2 ) 8 with water in the presence of diethylhydroxylamine followed by trimethylsilylation. Coating films were prepared by spin-coating of the coating solution prepared by the dehydrogenative condensation of POSS. The hardness of the coating films was evaluated using a pencil-hardness test and was found to increase up to 8H with increases in the curing temperature. Free-standing film and silica gel powder were prepared by aging the coating solution at room temperature. The silica gel powder was subjected to heat treatment under air atmosphere to show a specific surface area of 440 m 2 g −1 at 100• C, which showed a maximum at 400• C as 550 m 2 g −1 .
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