We developed new photo alignment materials based on chalconyl structure with high sensitivity to near UV light. Poly(4-methacryloyloxy chalcone), PM4Ch, and its derivatives exhibited good LC alignment upon near TJV exposure. The photoreactivity of chalconyl structure was high because due to longer wavelength of UV absorption. The high sensitivity of PM4Ch, compared with Poly(4'-methacryloyloxy chalcone), PMCh, could be explained by the suppression of isomerization and/or by the alignment capability of the side chain structure.
We developed new photo alignment materials based on chalcone structure with the high photo reactivity and high sensitivity to near UV light.Poly (4-methacryloyloxy chalcone), PM4Ch, and its derivatives exhibited good LC alignment capability upon near UV exposure. The LC alignment capability was preserved when the LC cells were annealed at 170°C. The possible photochemical degradation by deep UV can be prevented by using these new materials.
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