Interference alignment (IA) is a joint-transmission technique that achieves the maximum degrees-offreedom (DoF) of the interference channel, which provides linear scaling of the capacity with the number of users for high signal-to-noise ratios (SNRs). Most prior work on IA is based on the impractical assumption that perfect and global channel-state information (CSI) is available at all transmitters. To implement IA, each receiver has to feed back CSI to all interferers, resulting in overwhelming feedback overhead. In particular, the sum feedback rate of each receiver scales quadratically with the number of users even if the quantized CSI is fed back. To substantially suppress feedback overhead, this paper focuses on designing efficient arrangements of feedback links, called feedback topologies, under the IA constraint. For the multiple-input-multiple-output (MIMO) K-user interference channel, we propose the feedback topology that supports sequential CSI exchange (feedback and feedforward) between transmitters and receivers so as to achieve IA progressively. This feedback topology is shown to reduce the network feedback overhead from a quadratic function of K to a linear one. To reduce the delay in the sequential CSI exchange, an alternative feedback topology is designed for supporting two-hop feedback via a control station, which also achieves the linear feedback scaling with K. Next, given the proposed feedback topologies, the feedback-bit allocation algorithm is designed for allocating feedback bits by each receiver to different feedback links so as to regulate the residual interference caused by the finite-rate feedback. Simulation results demonstrate that the proposed bit allocation leads to significant throughput gains especially in strong interference environments.

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Double Patterning lithography is very fascinating way of lithography which is capable of pushing down the k1 limit below 0.25. By using double patterning lithography, we can delineate the pattern beyond resolution capability. Target pattern is decomposed into patterns within resolution capability and decomposed patterns are combined together through twice lithography and twice etch processes. Two ways, negative and positive, of doing double patterning process are contrived and studied experimentally. In this paper, various issues in double patterning lithography such as pattern decomposition, resist process on patterned topography, process window of 1/4 pitch patterning, and overlay dependent CD variation are studied on positive and negative tone double patterning respectively. Among various issues about double patterning, only the overlay controllability and productivity seemed to be dominated as visible obstacles so far.

Hunter syndrome (mucopolysaccharidosis II, MPS II) is a rare, X-linked disorder of glycosaminoglycan (GAG) catabolism caused by a deficiency in the activity of the lysosomal enzyme, iduronate-2-sulfatase (I2S). In this study, the medical records of 75 Korean patients with Hunter syndrome (74 males, 1 female) were retrospectively reviewed to investigate the frequency of organ involvement and survival at a single center. The three most common symptoms of organ involvement were hepatosplenomegaly (99%), facial dysmorphism (97%), and frequent otitis media (91%). Cardiovascular involvement was also common including valvular abnormalities (89%), left ventricular hypertrophy (68%), and hypertension (30%). The 19 patients who died had a median age of 16.8 years at the time of death. Four of them died within 1 year of the start of enzyme replacement therapy; autopsy showed myocardial infarction with severe coronary artery disease in one patient. Two other patients died due to pneumonia and sleep apnea. In one case, the cause of death was not investigated. The high incidence of hypertension, and the presence of valvular heart disease indicates that close cardiac monitoring is mandatory in all patients with Hunter syndrome, especially relatively older patients even if they are being treated with enzyme replacement therapy.