The band-gap opening in graphene is a key factor in developing graphene-based field-effect transistors. Although graphene is a gapless semimetal, a band gap opens when graphene is formed into a graphene nanoribbon (GNR). Moreover, the band-gap energy can be manipulated by the width of the GNR. In this study, we propose a site-specific synthesis of a width-tailored GNR directly onto an insulating substrate. Predeposition of a diamond-like carbon nanotemplate onto a SiO 2 /Si wafer via focused ionbeam-assisted chemical vapor deposition is first utilized for growth of the GNR. These results may present a feasible route for growing a width-tailored GNR onto a specific region of an insulating substrate.
Here, we demonstrate the decoration of Ni nanoparticles (NPs) on graphene films by simple annealing for p-type doping of graphene. Scanning electron microscopy and atomic force microscopy revealed that high-density, uniformly sized Ni NPs were formed on the graphene films. The density of the Ni NPs increased gradually, whereas the size of the Ni NPs decreased with increasing NiCl2·6H2O solution concentration. The formation of Ni NPs on graphene films was explained by heat-driven dechlorination and subsequent nano-particlization, as investigated by X-ray photoelectron spectroscopy. The doping effect of Ni NPs onto graphene films was verified by Raman spectroscopy and electrical transport measurements. This method may provide a facile and universal way to obtain metal NPs on graphene if the metal forms a compound with Cl.
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