Among the materials used as transparent electrodes, silver nanowires (AgNWs) have attracted attention because of their high transmittance and excellent conductivity. However, AgNWs have shortcomings, including their poor adhesion, oxidation by atmospheric oxygen, and unstable characteristics at high temperature. To overcome these shortcomings, multi-layer thin films with an aluminum-doped zinc oxide (AZO)/AgNW/AZO structure were fabricated using facing targets sputtering. The samples heated to 350 °C exhibited stable electrical characteristics. In addition, the adhesion to the substrate was improved compared with AgNWs layer. The AZO/AgNW/AZO thin films with multilayer structure overcame the shortcomings of AgNWs, and we propose their use as transparent electrodes with excellent properties for optoelectronic applications.

We have investigated electrical, optical and structural properties of silver nanowire (AgNW)/zinc oxide (ZnO) transparent conductive bilayer films for optoelectronic applications. The AgNW/ZnO transparent conductive bilayer films were fabricated using spin-coating and facing target sputtering (FTS) method. The spin-coated the AgNW layer has advantages, such as low resistivity and high transmittance in visible range. However, the spin-coated AgNW layers can be oxidized by natural oxygen. Consequently, the conductivity of AgNW layer was strongly decreased. So, an oxidation prevented layer is necessary. The ZnO thin film layer on the Ag NW layer can be prevented oxidation. In addition, the peeling of spin-coated AgNW layer were prevented the deposited ZnO thin film layer. As the results, the sheet resistance and average transmittance in visible range of AgNW/ZnO transparent bilayer thin films exhibited 34.1 ohm/sq. and 83.46%.

In this study, Schottky barrier diodes based on silicon carbide with various levels of Schottky metal layer input power were prepared and characterized. In this structure, molybdenum and aluminum were employed as the Schottky metal and top electrode, respectively. Schottky metal layers were deposited with input power ranging from 30 to 210 W. Schottky metal layers and top electrodes were deposited with a thickness of 3000 Å. The Schottky barrier heights, series resistances, and ideality factor were calculated from current–voltage (I–V) curves obtained using the Cheung–Cheung and Norde methods. All deposition processes were conducted using a facing targets sputtering system. Turn on voltage was minimized when the input power was 90 W, at which point electrical characteristics were observed to have properties superior to those at other levels of input power.

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