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In this paper we present the first ridge gap waveguide resonator made with a polymer base. It is designed for the frequency range 220 − 325 GHz, and is fabricated solely using a Au coated two-layer SU8-based process. The design is based on previous work done with Si. The new process has advantages such as fewer process steps and cheaper process steps. The SU8 ridge gap waveguide resonator is made in order to obtain attenuation characteristics via the measured Q-factor of the resonator. The ridge gap waveguide resonator has the same dimensions as the previous one fabricated in Si, and the same thickness of the Au coating. The SU8-based resonator shows an attenuation loss of 0.041 dB/mm at 282.2 GHz compared to the Si-based resonator with an attenuation loss of 0.043 dB/mm at 283.5 GHz. This makes the SU8 process a more cost-effective alternative to the Si process Corresponding author: S. Rahiminejad; email: rahimine@chalmers.se; phone: +46 31 772 1874

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This paper presents a novel fabrication method based on dry film photoresists to realize waveguides and waveguide-based passive components operating at the millimeter-wave frequency (30–300 GHz). We demonstrate that the proposed fabrication method has a high potential as an alternative to other microfabrication technologies, such as silicon-based and SU8-based micromachining for realizing millimeter-wave waveguide components. Along with the nearly identical transfer of geometrical structures, the dry film photoresist offers other advantages such as fewer processing steps, lower production cost, and shorter prototyping time over the conventional micromachining technologies. To demonstrate the feasibility of the fabrication process, we use SUEX dry film to fabricate a ridge gap waveguide resonator. The resonator is designed to exhibit two resonances at 234.6 and 284 GHz. The measured attenuation at 234 GHz is 0.032 dB/mm and at 283 GHz is 0.033 dB/mm for the fabricated prototype. A comparative study among different existing technologies indicates that the reported method can give a better unloaded Q-value than other conventional processes. The measured unloaded Q-values are in good agreement with the simulated unloaded Q-values. The signal attenuation indicates that SUEX dry film photoresists can be used to fabricate passive devices operating at millimeter-wave frequencies. Moreover, this new fabrication method can offer fast and low-cost prototyping.

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