In-situ analysis of the TiO2 / water interface via NAP-XPS is demonstrated in both a lab based system (NAP-cell configuration) and synchrotron endstation (backfill configuration). Ultra-thin wetting layers (UTWL) of liquid water (~10 nm) are formed on a rutile TiO2 surface with minimal contamination present in addition to unique insight during the growth of the liquid films as indicated via NAP-XPS, in-situ sample temperature and background vapour pressure monitoring. Chemical changes at the solid / liquid interface are also demonstrated via healing of Ti 3+ surface defect states. Photon depth profiling of the as grown liquid layers indicate that the formed films are ultra-thin (~10 nm) and likely to be continuous in nature. This work demonstrates a novel and flexible approach for studying the solid / liquid interface via NAP-XPS which is readily integrated with any form of NAP-XPS system, thereby making a critical interface of study available to a wide audience of researchers for use in operando electrochemical and photocatalytic research.
Demonstration of the redox behaviour of the mixed ceria zirconia whereby reduction of zirconia is compensated by ceria with the consequence that ceria should be more easily reduced.
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