We report on direct ink writing of a model yield-stress fluid and focus on the printability of the first layer, the one in contact with the supporting substrate. We observe a diversity of deposition morphologies that depends on a limited set of operational parameters, mainly ink flow rate, substrate speed and writing density, and also on material properties (e.g., yield-stress). Among these morphologies, one of them does not depend on fluid properties (as long as the fluid displays some yield-stress) and consists of flat films whose thickness is controllable in a significant range, about $$0.1{-}1$$ 0.1 - 1 mm, and tunable in real time during printing. We thus demonstrate the ability to print films with thickness gradients and prove that the printing fidelity is mainly due to a competition between yield-stress and capillarity.
We report on direct ink writing of a model yield stress fluid and focus on the printability of the first layer, the one in contact with the supporting substrate. We observe a diversity of deposition morphologies that depends on a limited set of operational parameters, mainly ink flow rate, substrate speed and writing density, and also on material properties (e.g., yield stress).Among these morphologies, one of them does not depend on fluid properties (as long as it displays some yield stress) and consists of flat films whose thickness is controllable in a significant range (about 0.1-1 mm) and tunable in real time during printing. We thus demonstrate the ability to print films with thickness gradients and prove that the printing fidelity is mainly due to a competition between yield stress and capillarity.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.
hi@scite.ai
10624 S. Eastern Ave., Ste. A-614
Henderson, NV 89052, USA
Copyright © 2024 scite LLC. All rights reserved.
Made with 💙 for researchers
Part of the Research Solutions Family.