To use atomic force microscope (AFM) to measure dense patterns of 32-nm node structures, there is a difficulty in providing flared probes that go into narrow vertical features. Using carbon nanotube (CNT) probes is a possible alternative. However, even with its extremely high stiffness, van der Waals attractive force from steep sidewalls bends CNT probes. This probe deflection effect causes deformation (or "swelling") of the measured profile. When measuring 100-nm-high vertical sidewalls with a 24-nm-diameter and 220-nm-long CNT probe, the probe deflection can cause a bottom CD bias of 13.5 nm. This phenomenon is inevitable when using long, thin probes whichever scanning method is used.We have developed a method of deconvolving this probe deflection effect that is well suited to our AFM scanning mode, AdvancedStep-in TM mode. In this scanning mode, the probe is not dragged on the sample surface but approaches the sample surface vertically at each measurement point. The CNT probe deformation is stable because we do not use cantilever oscillation that can cause instability, but we detect static flexure of the cantilever. Consequently, it is possible to estimate the amount of CNT probe deflection by detecting the degree of cantilever torsion. Using this information, we have developed a technique for deconvolving the probe deformation effect from measured profiles. This technique in combination with deconvolution of the probe shape effect makes vertical sidewall profile measurement possible.

Design rule shrinkage and the wider adoption of new device structures such as STI, copper damascene interconnects, and deep trench structures have increased the necessity of in-line process monitoring of step heights and profiles of device structures. For monitoring active device patterns, not test patterns as in OCD, AFM is the only non-destructive 3D monitoring tool. The barriers to using AFM in-line monitoring are its slow throughput and the accuracy degradation associated with probe tip wear and spike noise caused by unwanted oscillation on the steep slopes of highaspect-ratio patterns. Our proprietary AFM scanning method, Step in mode®, is the method best suited to measuring high-aspect-ratio pattern profiles. Because the probe is not dragged on the sample surface as in conventional AFM, the profile trace fidelity across steep slopes is excellent. Because the probe does not oscillate and hit the sample at a high frequency as in AC scanning mode, this mode is free from unwanted spurious noises on steep sample slopes and incurs extremely little probe tip wear. To fully take advantage of the above properties, we have developed an AFM sensor optimized for in-line use, which produces accurate profile data at high speeds.The control scheme we have developed for the AFM sensor, which we call "Smart Step-in", elaborately analyses the contact force signal, enabling efficient probe tip scanning and a low and stable contact force. The mechanism of the AFM sensor has been optimized for the higher scanning rate and has improved the accuracy, such as the scanning planarity, position and height accuracy, and slope angle accuracy. Our prototype AFM sensor can scan high-aspectratio patterns while stabilizing the contact force at 3 nN. The step height measurement repeatability was 0.8 nm (3σ). A STI-like test pattern was scanned, and the steep sidewalls with angles of 84° were measured with high fidelity and without spurious noises.

Metal-filled carbon nanotubes (CNTs) are known to be used as pen-tip injectors for 3D manufacturing on the nanoscale. However, the CNT interior cannot accumulate enough material to fabricate complex metallic nanostructures. Therefore a method for refilling the CNT cartridge needs to be developed. The strategy for refilling of CNT cartridges is suggested in this study. Controlled growth of gold nanowires in the interior of isolated CNTs using a real-time manipulator installed in a transmission electron microscope is reported herein. The encapsulation process of discrete gold nanoparticles in the hollow spaces of open-ended multi-wall CNTs was evaluated in detail. The experimental results reveal that the serial loading of isolated gold nanoparticles allows the control of the length of the loaded nanowires with nanometer accuracy. Thermophoresis and the coalescence of gold nanoparticles are assumed to be the primary mechanisms responsible for gold loading into a CNT cartridge.

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To use atomic force microscope (AFM) to measure dense patterns of 32-nm node structures, there is a difficulty in providing flared probes that go into narrow vertical features. Using carbon nanotube (CNT) probes is a possible alternative. However, even with its extremely high stiffness, van der Waals attractive force from steep sidewalls bends CNT probes. This probe deflection effect causes deformation (or "swelling") of the measured profile. When measuring 100-nm-high vertical sidewalls with a 24-nm-diameter and 220-nm-long CNT probe, the probe deflection can cause a bottom CD bias of 13.5 nm. This phenomenon is inevitable when using long, thin probes whichever scanning method is used. We proposed a method to deconvolve this probe deflection effect. By detecting torsional motion of the base cantilever for the CNT probe, it is possible to estimate the amount of CNT probe deflection. Using this information, we have developed a technique for deconvolving the probe deformation effect from measured profiles. This technique, in combination with deconvolution of the probe shape effect, enables vertical sidewall profile measurement.We have quantitatively evaluated the performance of the proposed method using an improved version of a "tip characterizers" developed at the National Institute of Advanced Industrial Science and Technology (AIST), which has a well-defined high-aspect-ratio line and space structure with a variety of widths ranging from 10 to 60 nm. The critical dimension (CD) values of the line features measured with the proposed AFM method showed good matches to TEMcalibrated CD values. The biases were within a range of ±1.7 nm for combinations of three different probes, five different patterns, and two different threshold heights, which is a remarkable improvement from the bias range of ±4.7 nm with the conventional probe tip shape deconvolution method. The static repeatability was 0.54 nm (3σ), compared to 1.1 nm with the conventional method. Using a 330-nm-deep tip characterizer, we also proved that a 36-nm-narrow groove could be clearly imaged.