Output luminescence of Zn2SiO4 : Mn phosphor saturates under intense vacuum ultraviolet radiation having a relatively high excitation duty ratio. The saturation is attributed to the depletion of activators at the ground level. This depletion originates from the long decay time constant of the phosphor. The saturation mechanism is explained analytically using a simple model, and the conditions for efficient phosphor excitation are derived.
The small-field exposure tool (SFET) for extreme ultraviolet (EUV) lithography was manufactured by Canon and EUVA and installed in Selete. It is being used for developing mask, resist, and tool technologies. In this paper, we review the current status of SFET development and present some initial results on lithographic performance and tool stability.
New approaches to measuring lens aberration of optical exposure tools in semiconductor manufacturing environment are discussed. First, plural image quantities are measured and expressed by linear combinations of contributions from several Zernike aberration terms. Then, the linear problem is solved to find the best combination of each term to explain the experimental results. Using side-lobe intensity near octagonal aperture edges in an attenuated phase-shifting mask as a detector, third-order Coma and trifoil aberrations were successfully measured.
An intense vacuum ultraviolet spike 0.2 μs in width is observed at the initial stage of low-pressure Xe discharge, i.e., Xe Townsend discharge, in submillimeter tubes. The intensity of the 147 nm resonance line reaches 1.3 W/cm2, about 200 times stronger than that obtained from the steady-state Xe positive column. Efficiency of the vacuum ultraviolet radiation exceeds 24%, or 32 lm/ W when green phosphor is excited, four times higher than that of the positive column, or more than an order of magnitude higher than that of the negative glow. This high intensity and efficiency originate from the optimized electron energy which can be adjusted externally by changing the electric field and pressure, contrary to that in the positive column or negative glow. Another important feature of the Townsend discharge is its wide dynamic range of operation, which is advantageous when driving a panel having a large number of cells with scattered discharge characteristics. Consequently, a gas discharge display panel utilizing the Townsend discharge has more than an order of magnitude higher efficiency than the positive column or negative glow panels.
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