The plasma maskless processing method combines the advantages of plasma etching and scanning probe processing, such as high etching efficiency, wide range of applicable materials, and high resolution. This method is based on the probe driving and detection of piezoelectric thin films, which enables all probes in the array to be processed completely independently, greatly improving the overall processing efficiency, and can effectively etch specific nano-scale regions of various materials. And it provides an effective solution for efficiently processing small batches of multi-variety micro-nano devices. In this study, a hollow needle tip with nanoholes was fabricated by plasma maskless processing, and use edge computing to calculate the complex surface shape of the needle tip. By establishing a plasma reactor, using the calculation method of the complex surface edge of the needle tip, and testing the stability of the processed nanotip by means of filling air pressure and power excitation in the experiment. The results show that when the breakdown voltage SF6 discharges, with the increase of air pressure, the breakdown voltage of the arrester first decreases and then increases gradually, and it is the smallest at 5 kPa and reaches the optimal 490 V, (PD) m = 0.5 Pa·m. And the Ar reaction ionization potential (15.76 eV) and excitation potential (11.53 eV, 11.72 eV) are lower than the splitting potential (≥16 eV) of SF6. As time goes on, high-energy particles are neutralized with the vessel wall, so the ion concentration is gradually smaller, sparse between 200 and 250, and increases from 100 to 300, which is close to the peak value, according to the gradual increase of the discharge voltage. The data obtained from the experimental test proves the reliability of the nanotips prepared in this study, and the properties remain stable under different breakdown voltages. Therefore, the nanohole hollow tip processed by maskless scanning plasma in this study has reached the standard of process use and has important application significance.

With the gradual development of modern technology, there are still areas that need to be broken through in the field of science. In today’s society, the application range of noncurved mirrors is becoming more and more extensive. The application of aspheric mirrors will not only improve the imaging quality in all aspects but also improve the application of aspheric surfaces in aerospace, military, optics, physics, etc., and enhance economic benefits. Silicon carbide materials can be used in combination with noncurved mirror materials and produced in the market. This paper mainly studies how to prepare silicon carbide nanomaterials and discusses the relevant characteristics of silicon carbide through the preparation of silicon carbide materials. The aspheric mirror is mainly based on the large-diameter, high-precision aspheric mirror manufacturing system as the research background, which provides certain work experience for the follow-up research. Through the background research of the optical system of the aspheric mirror, this paper analyzed the essentials of aspheric processing technology and then combined the related content of the silicon carbide nanometer and the aspheric mirror. Nowadays, with the development of science and technology, the development prospects of silicon carbide nanomaterials are also more and more broad. After the entire production line of silicon carbide material was put into the production line, it has been recognized by the market, and the benefits are very good, bringing great production benefits to people, and it can be produced on a large scale in the future.

Fused silica is produced by melting high-purity silica and then rapidly cooling it. It has good physical and chemical properties, which also make it the raw material for most components in the optical industry, and is widely used in optical fiber communications, semiconductors, and aerospace. The content of SiO2 in fused silica is as high as 99.995% or more, but some impurities will still be generated during production and processing. The impurity elements of its optical curved surface can induce damage to the fused silica and adversely affect its performance, thereby affecting the performance of the fabricated element. In this paper, the impurities in the nanostructure of the fused silica optical surface are mainly analyzed, and the impurities on the surface are qualitatively and quantitatively analyzed by the characterization methods of secondary ion mass spectrometry (SIMS) and X-ray diffraction analysis, respectively. The main component type and content of impurities were measured. The experimental results have an important impact on the production and preparation of optical components using fused silica as raw materials, which can remove surface impurities in a targeted manner and better utilize the advantages of fused silica materials.