We describe a novel UV-curable mold that is stiff enough for replicating dense sub-100-nm features even with a high aspect ratio. It also allows for flexibility when the mold is prepared on a flexible support such that large area replication can be accomplished. The composite material of the mold is inert to chemicals and solvents. The surface energy is made low with a small amount of releasing agent such that the mold can be removed easily and cleanly after patterning. In addition, the material allows self-replication of the mold. These unique features of the mold material should make the mold quite useful for various patterning purposes.
Novel carbon-based microporous nanoplates containing numerous heteroatoms (H-CMNs) are fabricated from regenerated silk fibroin by the carbonization and activation of KOH. The H-CMNs exhibit superior electrochemical performance, displaying a specific capacitance of 264 F/g in aqueous electrolytes, a specific energy of 133 Wh/kg, a specific power of 217 kW/kg, and a stable cycle life over 10000 cycles.
Modulus-tunable ultraviolet (UV) curing molds allow not only physical patterning of
imprinting but also chemical patterning of microcontact printing. The mechanical properties
of the mold can be tailored by the chain length of an acrylate modulator in the cross-linking
reaction. This tunability can be utilized to obtain a proper balance that is needed for a given
patterning technique between the rigidity requirement (tensile modulus = 320 MPa) of a
mold for patterning a fine structure and the flexibility requirement (tensile modulus = 19.8
MPa) for a conformal contact. Successful low-pressure imprinting of sub-100-nm patterns
and microcontact printing of submicrometer patterns verify the suitability of the mold for a
wide spectrum of patterning techniques.
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