A compressive strained SiGe channel grown-on-SOI structure which can be applicable to next generation high performance CMOSs was applied to p-MOSFETs. The mobility behavior depending on effective fields, E eff , was investigated by varying Ge concentrations in the SiGe layer. We confirmed that the mobility enhancement factor increases with both Ge concentration and E eff , and quite depends on E eff . In particular, we demonstrated that hole mobility enhancement factor at the effective fields of 0.13 MV/cm amounted to 1.51 for 34 at% Ge. In addition, we observed that the strain of 0.23 induced by 56.5-at% Ge concentration in SiGe grown-on-SOI structure could not increase hole mobility at the effective fields range from 0.05 to 0.13 MV/cm because of high density of dislocations.
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