A technique for the measurement of the absolute electron density in low-pressure plasmas using microwaves is described. It is based on observing the propagation of electromagnetic surface waves (SW) at a plasma-sheath boundary, guided by a dielectric cylinder immersed in the plasma. The transmission spectrum is measured between two antennas situated at either end of the dielectric cylinder and connected to a network analyser. Analytical theory based on the Trivelpiece-Gould work (Trivelpiece and Gould 1959 J. Appl. Phys. 30 1784, Trivelpiece 1967 indicates that the lowest frequency at which the SW can propagate is equal to 1/ √ 2 of the plasma frequency, which is directly related to the electron number density at the plasma-sheath boundary. We call this probe the plasma transmission probe (PTP) in contrast to the plasma absorption probe proposed by Sugai and co-workers (Kokura et al 1999 Japan. J. Appl. Phys. 38 5262). The PTP is promising for the measurement of low densities ( 10 9 cm −3 ) at relatively high gas pressure ( 1 Torr). An axi-symmetric finite element model of the probe is presented and used to calculate transmission spectra. Experimental spectra measured in a radio-frequency capacitively coupled discharge in argon at various plasma densities and pressures (40-750 mTorr) are presented and compared with the calculated ones. Plasma densities derived from the transmission spectra were compared with those obtained with a Langmuir probe. The PTP was also compared with a microwave 1/4-wave resonator ('hairpin probe') at low pressure (5-45 mTorr) in an ICP discharge in argon. The densities determined by the PTP were found to be lower by a factor of 0.5-0.7 compared with those obtained with a Langmuir and a hairpin probe. We believe this can be attributed to the pre-sheath plasma density gradient, as the PTP determines the sheath edge electron density, not the bulk value.
A broad-band, inline current-voltage probe, with a characteristic impedance of 50 Ω, is presented for the measurement of voltage and current waveforms, impedance, and power in rf systems. The probe, which uses capacitive and inductive sensors to determine the voltage and current, respectively, can be used for the measurement of single or multi-frequency signals into both matched and unmatched loads, over a frequency range of about 1-100 MHz. The probe calibration and impedance/power measurement technique are described in detail, and the calibrated probe results are compared with those obtained from a vector network analyzer and other commercial power meters. Use of the probe is demonstrated with the measurement of power into an unmatched capacitively coupled plasma excited by multi-frequency tailored voltage waveforms.
Driving radiofrequency capacitively coupled plasmas by multiharmonic tailored voltage waveforms (TVWs) has been shown to allow considerable control over various plasma properties for surface processing applications. However, industrial adoption of this technology would benefit from more efficient solutions to the challenge of impedance matching the radiofrequency power source to the load simultaneously at multiple harmonic frequencies. The authors report on the design and demonstration of a simple, practical multifrequency matchbox (MFMB) based on a network of LC resonant circuits. The performance of the matchbox was quantified in terms of a range of matchable impedances (when matching a single frequency at a time), as well as for the independence of each match to changes at adjacent harmonics. The effectiveness of the MFMB was demonstrated experimentally on an Ar plasma excited by a three-frequency TVW with a fundamental frequency of 13.56 MHz. Under the plasma conditions studied, the power coupling efficiency (at the generator output) was increased from less than 40% (without impedance matching) to between 80% and 99% for the different exciting frequencies.
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