The effects of addition of a series of organoamine molecules on the luminescence of porous silicon has been examined by steady-state photoluminescence (PL) and Fourier transform infrared spectroscopies. These samples, prepared nonanodically via stain etching techniques and characterized by atomic force microscopy, show dramatic quenching of visible PL upon addition of dilute solutions of the above Lewis base adsorbates. The fractional changes in integrated PL intensity as a function of quencher concentration obey a simple equilibrium model, demonstrating Langmuir-type behavior from which equilibrium constants can be calculated. An observation concomitant with this loss of PL is a diminution of the silicon hydride stretching frequencies near 2100 cm−1.
We report here studies on the effects of Lewis base addition on the observed luminescence of porous silicon generated non-anodically from a stain etch of <100> p-type wafers and whose surface morphology has been characterized by atomic force microscopy (AFM). Addition of dilute heptane solutions of alkyl amines such as n-butyl amine (C4H7NH2) results in dramatic quenching of the steady-state photoluminescence (PL) near 625 nm. The observed fractional changes in integrated PL intensity as a function of amine concentration have been fit to a simple equilibrium model demonstrating Langmuir-type behavior from which adduct formation constants have been calculated. These steady-state PL measurements are complemented by Fourier Transform Infrared (FT IR) spectroscopic measurements monitoring the effect of amine adsorption on the silicon hydride stretching modes [v(Si-Hx)] near 2100 cm-1. Based on these results, a physical model for the amine interactions with the porous silicon surface is presented.
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