The CTA film can be characterized by e.g. its relatively high moisture regain, significantly low birefringence, and moderate mechanical strength. Having been commercialized more than fifty years ago, it has been widely used as photographic film, protective film for polarizing plate, and optical compensation film for liquid crystal display (LCD). The photographic film application exploits the optical isotropy and unique physical properties of the CTA film. In the application of the CTA film to protective film for polarizing plate, its low in‐plane birefringence is of particular importance. In the optical compensation to enhance the viewing angle of LCD, the CTA film, because of its moderate retardation in thickness direction (Rth), serves as an element of compensator as well as a base film. Considering the growth of the LCD market, the demand for CTA film is believed to be further expanding.
Solid films that reflect visible light due to chiral nematic order can be prepared from lyotropic ethylcellulose (EC) and (acetyl)(ethyl)cellulose (AEC) mesophases by a three-step casting method. A thin uniform film of desired thickness is cast from dilute solution onto a substrate. The film and substrate are then equilibrated with a mesophase of the same polymer in an appropriate solvent. The mesophase is a convenient source of solvent vapor at an appropriate composition and vapor pressure for the equilibration process. After equilibration, the solvent is allowed to evaporate, leaving a film that reflects visible light. The reflection wavelength of the EC film depends on the activity of the equilibrating vapor and the degreee of polymerization. Reflection intensity is governed by the degree of polymerization and the length of the equilibration period. The EC films showed good selectivity in reflection of left-circularly polarized light. Acetylation of EC gives AEC, which forms mesophases that reflect right-circularly polarized light. The three-step casting process was used to produce right-circularly polarizing films of AEC. The effects of degree of polymerization, equilibration concentrations, and temperature on the wavelength and intensity of the AEC reflection peak were measured by apparent circular dichroism and UV−visible spectrometry.
Background Because autotaxin reportedly has a better performance than hyaluronic acid as a marker for liver fibrosis for the prediction of cirrhosis caused by hepatitis C, we aimed to further evaluate the role of autotaxin in liver fibrosis of other aetiologies. Methods Autotaxin antigen was measured in serum samples from 108 patients with chronic hepatitis B and 128 patients with non-alcoholic fatty liver disease who had undergone a liver biopsy as well as healthy subjects and patients with chronic kidney disease, diabetes mellitus, rheumatoid arthritis and cardiac dysfunction. Results When evaluated using receiver operator characteristics curves, the performance of autotaxin for the prediction of significant fibrosis (F2-F4) in chronic hepatitis B patients was better than that of hyaluronic acid or type IV collagen 7S. In non-alcoholic fatty liver disease patients, however, the performance of autotaxin for the prediction of significant fibrosis was poorer than that of hyaluronic acid or type IV collagen 7S. The increase in the serum autotaxin concentrations was less notable than that of hyaluronic acid or type IV collagen in patients with chronic kidney disease, diabetes mellitus, rheumatoid arthritis or cardiac dysfunction. Food intake did not affect the serum autotaxin concentrations. Conclusions Autotaxin is useful as a serum marker for liver fibrosis caused by not only chronic viral hepatitis C but also by hepatitis B, although it was less useful in patients with non-alcoholic fatty liver disease. The increase in serum autotaxin concentrations is fairly specific for liver fibrosis, and the serum autotaxin concentrations can be analysed without consideration of food intake before blood collection.
The influence of line-edge roughness (LER) on transistor performance was investigated experimentally and the preciously proposed guideline for CD and LER measurements was examined.First, regarding the transistor-performance measurements, a shift of roll-off curves caused by LER within a gate pattern was observed. Moreover, the effect of transistor-width fluctuation originating from long-period LER was found to cause a variation in transistor performance. Second, regarding LER and CD metrology, the previously reported guideline was validated by using KrF and ArF resist-pattern samples. It was found that both CD and LER should be evaluated with the 2-µm-long inspection area. Based on this guideline, a comprehensive approach for evaluating LER and CD for transistor fabrication process is presented. The authors consider that this procedure can provide useful information for the 65-nm-node technology and beyond.
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