This study compares the hierarchical value maps (HVMs) for portal sites, smart phones, and social network services (SNSs) according to means-end chain theory. Means-end chain theory offers insights into how a media product satisfies the personal values of consumers. We derive the HVM for each media and investigate the effect of involvement on the HVM structure. A total of 424 individuals were queried for their opinions on the attributes, functional consequences, psychological consequences, and value of each media product through association pattern technique laddering. These elements constitute the value chain structure. Our findings show that the value of each media is determined by involvement levels. For each media, high-involvement user groups regard self-satisfaction as the most important value they aspire for. This study determines that different levels of involvement do not affect the relationships among the elements of the value chain. HVMs for smart phones, portal sites, and SNSs are focused on a special value. However, the level of involvement generally does not seem to alter the structures of HVMs.
Silicon nitride (SiN) films were deposited using a plasma-enhanced chemical vapor deposition system (PECVD). The charge density of the SiN films was modeled using a generalized regression neural network (GRNN). The PECVD process was characterized by means of a face-centered Box Wilson experiment. The prediction performance of the GRNN model was optimized using a genetic algorithm (GA). The GA-GRNN model significantly improved the GRNN prediction performance by more than 55 %. The optimized GA-GRNN model was used to investigate the effects of various parameters on the charge density. A higher charge density was obtained at higher temperatures (i.e. a lower H concentration). Increasing the pressure increased the charge density at all temperatures levels with a much stronger impact at a lower H concentration. The effects of the SiH4 and N2 (or NH3) flow rates on the charge density were similar in that a higher charge density was achieved at a lower Si-N ratio (N-rich films). A considerable increase in the charge density with a radio frequency power at a lower NH3 flow rate was attributed to the generation of more Si-H than N-H bonds.
Charging damage can critically degrade oxide reliability. Antenna-structured metal-oxide-semiconductor field-effect transistors were fabricated to examine the effect of process parameters on charging damage. Charging damage to threshold voltage (Vth) was investigated experimentally as well as by constructing a neural network model. For a systematic modeling, charging damage process was characterized by means of a face-centered Box–Wilson experiment. The prediction performance of neural network model was optimized by applying genetic algorithm. A radio frequency source power was identified as the most influential factor. This could be more ascertained by the insignificant impact of bias power or gas ratio. Using the model, implications of plasma nonuniformity and polymer deposition were examined under various plasma conditions.
This is an Open Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/by-nc/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited. AbstractThe goals of this study are to analyze how fashion professionals' attitudes toward Grunge style have changed since the 1990s and to compare aesthetic features of 1990s Grunge style and the style since 2000. By searching Vogue and Women's Wear Daily articles from 1992 to 2014 according to the keyword "Grunge," three collections from the 1990s and 59 collections since 2000 were selected for analysis. Although Grunge collections of the 1990s were harshly criticized by critics and retailers as ugly, the more recent collections have been highly praised for both design and profitability. The common aesthetic features of Grunge style in the 1990s and beyond include loose silhouettes, mix-and-match layerings, plaid patterns, floral prints, and striped patterns. However, Grunge style since 2000 has new features such as ornate fabrics, handcrafted details, a formal and dressy look, and faux plaid flannel shirts in chiffon or organza. These features give the style a more luxurious, feminine, and refined appearance. The results of this study indicate that Grunge style of the 1990s changed high fashion beauty standards and today's designers and consumers prefer to mix various styles to create new ones. They typically do not consider the original spirit or identities of the varied styles.
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