The GaAs nanowires are grown on Si (111) substrates by Ga-assisted molecular beam epitaxy growth technique. The effect of SiO2 thickness on the structural properties of GaAs nanowires is investigated by Scanning Electron Microscope (SEM). The nucleation of GaAs nanowires related to the presence of a SiO2 layer previously coated on Si substrate. The results show that the density, length, and diameter of GaAs nanowires strongly depend on the oxidation time (or SiO2 thickness).
In this work GaAs nanowires were grown by self-assisted growth method with completely identical growth parameters, such as growth temperature, growth time, Ga and As flux, on GaAs (111)B and Si (111) substrates using Molecular Beam Epitaxy (MBE). All samples were then characterized by Scanning Electron Microscope (SEM), Energydispersive X-ray spectroscopy (EDX), and X-ray Diffraction (XRD). The results from both substrates were compared in order to understand the effect of substrate type on nanowires.
This research focuses on the impact of native SiO2 layer evolution, occurring on the surfaces of Si(111) substrates on the morphological and structural properties of self-assisted GaAs nanowires. GaAs nanowires growth were grown on Si(111) substrates, already covered with native SiO2 developing in different states with identical growth parameters including growth temperature, growth time, and Ga and As flux, using self-assisted VLS process by MBE technique. Results from nanowire samples and substrates were compared to understand the correlation between the changes in appearance of native SiO2 layer and the changes in the growth pattern of the nanowires.
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