A brief review is presented of the ‘‘Raduga’’ 1–4 repetitively pulsed metal vapor vacuum arc ion sources. Their operation principles and functional ranges are described. The Raduga ion sources provide single- and multi-element implantation. These advantages are achieved by using not only pure single-element or mixed ion fluxes, but also pulsed beam sequences with controllable composition and energy of each ion species. Another feature of the ion sources is their ability to generate a sequence of ion beam and plasma stream pulses. Switching between ion irradiation and plasma deposition can be done from pulse to pulse, within each pulse, or after accumulation of a required dose. Some specific features of the emission properties of broad beam metal vapor vacuum arc ion sources are described.
Articles you may be interested inEffect of sheath evolution on metal ion implantation in a vacuum arc plasma source J. Appl. Phys. 89, 923 (2001); 10.1063/1.1331072 Characteristics and design of metal vacuum arc plasma source power supply for pulsed-mode plasma immersion ion implantation Rev. Sci. Instrum. 71, 4435 (2000)Development of vacuum arc ion sources for heavy ion accelerator injectors and ion implantation technology (invited) Rev. Sci.
Two versions of vacuum arc sources for producing accelerated ion beams and plasma flows are described. The sources are distinguished by use of a dc vacuum arc discharge for plasma generation on the basis of a simple linear or coaxial plasma gun with extended large area (70 300 and 1500 cm2) cathodes and microparticle filtering system. The dc vacuum arc discharge combined with the diode extraction system enables us to use the single source for dc mode of plasma flow formation and repetitively pulsed mode of ion beam generation. Experimental and numerical results are presented on the repetitively pulsed accelerated ion beam formation in the vacuum arc sources with large area cathodes.
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