The present work deals with the study of the human equilibrium using an ambulatory e-health system. One of the point on which we focus is the fall risk, when losing equilibrium control. A specific postural learning model is presented, and an ambulatory instrumented insole is developed using 3 pressures sensors per foot, in order to determine the real-time displacement and the velocity of the centre of pressure (CoP). The increase of these parameters signals a loss of physiological sensation, usually of vision or of the inner ear. The results are compared to those obtained from classical more complex systems.
In order to monitor pressure under feet, this study presents a biomechanical model of the human foot. The main elements of the foot that induce the plantar pressure distribution are described. Then the link between the forces applied at the ankle and the distribution of the plantar pressure is established. Assumptions are made by defining the concepts of a 3D internal foot shape, which can be extracted from the plantar pressure measurements, and a uniform elastic medium, which describes the soft tissues behaviour. In a second part, we show that just 3 discrete pressure sensors per foot are enough to generate real time plantar pressure cartographies in the standing position or during walking. Finally, the generated cartographies are compared with pressure cartographies issued from the F-SCAN system. The results show 0.01 daN (2% of full scale) average error, in the standing position.
A critical step in the fabrication of polycrystalline silicon thin-film transistors (TFT's) is to crystallize the amorphous silicon layer deposited on glass. This paper describes a complete rapid thermal annealing (RTA) process applied to the crystallization of the amorphous layer. The RTA heating and cooling rates have been optimized to minimize thermal gradients and to improve glass substrate stability. Numerical simulations taking into account the lamp characteristics, the annealing chamber configuration and the sample properties have been developed and allow elucidation of thermal nonuniformities in the sample during the RTA process. Although the transition point of a glass (T
g) is often considered as an upper limit in usual polysilicon TFT's processes, this paper shows that if the cooling rate is accurately controlled, annealing temperatures can be above T
g without thermal damage to the glass.
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