The thermal conductivity of thin films (0.01-100 H.m) governs the heat transfer characteristics, and hence affects the performance and reliability of microelectronic devices in which they are used. To measure the thermal conductivity of these films, several different techniques (steady state and transient), including the use of laser light have been developed. Further, new methods of thin film deposition have also been developed. This paper reviews these experimental and analytical techniques and the thermal conductivity results obtained. It is shown that that the results obtained by these different measurement techniques and deposition methods vary significantly. This emphasizes the importance of measuring the thermal conductivity of thin film materials that closely resemble those being used in the application.
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