Transition from two-dimensional to three-dimensional growth mode has been investigated by photoluminescence in highly strained InxGa1−xAs/GaAs (0.36≤x≤1) single quantum wells. The structures were grown by molecular beam epitaxy from 410 to 590 °C. The critical layer thickness based on this transition decreased as the growth temperature increased. This behavior was well described by the single-kink Matthews model [J. Vac. Sci. Technol. 12, 126 (1975)] including the simplest expression of the Peierls–Nabarro friction stress [J. Appl. Phys. 41, 3800 (1970)].
Parabolic AlxGa1−xAs/GaAs quantum wells have been grown by molecular beam epitaxy with linear ramping of the Al effusion cell temperature, where the ramping rate was carefully analyzed to avoid a flux lag. The calculated potential profile from the temperature variation was very close to the parabolic one. Low-temperature photoluminescence showed clear interband transitions up to the n=3 sublevels. The equal energy spacing between adjacent transitions involving heavy-hole states confirmed the parabolic shape of the quantum well.
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