The advent of sub-micron technology in semiconductor device fabrication has placed a greater emphasis on calibration control of metrology instruments. As device dimensions shrink, accuracy requirements for suck instruments is gaining more importance. This paper will discuss the initial set-up methodolog)' during start-up and the control procedures for routine maintenance of metrology instruments in our advanced submicron wafer fab. A methodical approach to determining systematic error associated with metrology instruments, using the concepts of tool accuracy, gauge repeatability and reproducibility is presented.Start-up and routine monitoring results for certain critical metrology instruments such as ellipsometers, scanning electron microscopes, and particle detectors is presented to illustrate our approach.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.