Alo.75Gao,25As/lno,2~Ga0.75As/G8As HIGFE P Technology for High Abstract Results are presented from the first submicron gate length Complementary Hetwostructure Insulated Gate Field Effect Transistor (C-HIGFET) devices and circuitls (n-and p-HIGFET gate lengths of 0.7 pm). Thils reduction in gate length results in a factor of two increase in the switching speed of C-HIGFET gates, and a 35% reduction in switchingpowerhquency without any corresponding increase in the standby power consumption. Fully functional 4Kbit SRAMs have been fabricated using this submicron C-HIGFET technology, and operation of 4Kbit SRAMs at clock frequencies of up to 360 MHz have been demonstrated.
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We present the design of a four-chord laser interferometer system operating at 633 nm that will measure the electron density of field-reversed configurations (FRCs) produced by the magnetized target fusion (MTF) experiment at the Air Force Research Laboratory. The design is a modified version of an eight-chord system previously used to provide timeresolved information about the spatial distribution of electron density in a similar FRC experiment.' With the current system, a fanned array of laser beams will probe the plasma through the FRC midplane along four different chords, and the optical phase shift of each beam relative to a reference beam will be used to infer the line integrated electron density. In addition, a new feature of our design will be the option of diverting any or all of the four probe beams into single-mode optical fibers whose collimated outputs can used to probe different axial locations simultaneously.2 This fiber-optic probe beam modification will enable us to place the interferometer system's optical table at a safe distance from the MTF-FRC experiment when destructive tests involving plasma compression by a solid metal liner imploded by the Shiva Star capacitor bank are attempted.1. E. L. Ruden et al., "Multichord optical interferometry of FRX-L's field reversed configuration," Rev. Sci. Instrum. 77, 103502 (2006). 2. L. M. Smith et al., "A fiber-optic interferometer for in situ measurements of plasma number density in pulsed-power applications," Rev. Sci. Instrum. 74, 3324 (2003).
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