In the late nineteenth century, Heinrich Hertz demonstrated that the electromagnetic properties of materials are intimately related to their structure at the subwavelength scale by using wire grids with centimetre spacing to manipulate metre-long radio waves. More recently, the availability of nanometre-scale fabrication techniques has inspired scientists to investigate subwavelength-structured metamaterials with engineered optical properties at much shorter wavelengths, in the infrared and visible regions of the spectrum. Here we review how optical metamaterials are expected to enhance the performance of the next generation of integrated photonic devices, and explore some of the challenges encountered in the transition from concept demonstration to viable technology.

Periodic structures with a sub-wavelength pitch have been known since Hertz conducted his first experiments on the polarization of electromagnetic waves. While the use of these structures in waveguide optics was proposed in the 1990s, it has been with the more recent developments of silicon photonics and high-precision lithography techniques that sub-wavelength structures have found widespread application in the field of photonics. This review first provides an introduction to the physics of sub-wavelength structures. An overview of the applications of sub-wavelength structures is then given including: anti-reflective coatings, polarization rotators, high-efficiency fiber-chip couplers, spectrometers, high-reflectivity mirrors, athermal waveguides, multimode interference couplers, and dispersion engineered, ultra-broadband waveguide couplers among others. Particular attention is paid to providing insight into the design strategies for these devices. The concluding remarks provide an outlook on the future development of sub-wavelength structures and their impact in photonics.

We propose a silicon waveguide-fiber grating coupler that uses a subwavelength microstructure to achieve a continuously variable grating strength yet can be fabricated using only a single etch step. By adjusting the subwavelength microstructure at every point along the grating, the grating coupler can be optimized to give high field overlap with the optical fiber mode and also minimize backreflections along the incident waveguide path. Our design example is optimized for quasi-TM mode in a silicon photonic-wire waveguide, as required for waveguide evanescent-field-sensing applications. A field overlap of up to 94% with a standard single-mode optical fiber (SMF-28) is achieved by coupler apodization. Backreflection from the grating is reduced to ~0.1%, and the total predicted photonic wire to fiber coupling efficiency is 50%.

We demonstrate supercontinuum generation spanning 1.6 octaves in silicon nitride waveguides. Using a 4.3 cm-long waveguide, with an effective nonlinearity of γ=1.2 W(-1) m(-1), we generate a spectrum extending from 665 nm to 2025 nm (at -30 dB) with 160 pJ pulses. Our results offer potential for a robust, integrated, and low-cost supercontinuum source for applications including frequency metrology, optical coherence tomography, confocal microscopy, and optical communications.

Nanophotonic beamsplitters are fundamental building blocks in integrated optics, with applications ranging from high speed telecom receivers to biological sensors and quantum splitters. While high-performance multiport beamsplitters have been demonstrated in several material platforms using multimode interference couplers, their operation bandwidth remains fundamentally limited. Here, we leverage the inherent anisotropy and dispersion of a sub-wavelength structured photonic metamaterial to demonstrate ultra-broadband integrated beamsplitting. Our device, which is three times more compact than its conventional counterpart, can achieve highperformance operation over an unprecedented 500 nm design bandwidth exceeding all optical communication bands combined, and making it one of the most broadband silicon photonics components reported to date. Our demonstration paves the way toward nanophotonic waveguide components with ultrabroadband operation for next generation integrated photonic systems.

Segmenting silicon waveguides at the subwavelength scale produce an equivalent homogenous material. The geometry of the waveguide segments provides precise control over modal confinement, effective index, dispersion and birefringence, thereby opening up new approaches to design devices with unprecedented performance. Indeed, with everimproving lithographic technologies offering sub-100-nm patterning resolution in the silicon photonics platform, many practical devices based on subwavelength structures have been demonstrated in recent years. Subwavelength engineering has thus become an integral design tool in silicon photonics, and both fundamental understanding and novel applications are advancing rapidly. Here, we provide a comprehensive review of the state of the art in this field. We first cover the basics of subwavelength structures, and discuss substrate leakage, fabrication jitter, reduced backscatter, and engineering of material anisotropy. We then review recent applications including broadband waveguide couplers, high-sensitivity evanescent field sensors, low-loss devices for mid-infrared photonics, polarization management structures, spectral filters, and Manuscript

Directional couplers are extensively used devices in integrated optics, but suffer from limited operational wavelength range. Here we use, for the first time, the dispersive properties of sub-wavelength gratings to achieve a fivefold enhancement in the operation bandwidth of a silicon-on-insulator directional coupler. This approach does not compromise the size or the phase response of the device. The sub-wavelength grating based directional coupler we propose covers a 100 nm bandwidth with an imbalance of ≤ 0.6 dB between its outputs, as supported by full 3D FDTD simulations.

Continuously apodized fiber-to-chip surface grating coupler with refractive index engineered subwavelength structure Halir, R.; Cheben, P.; Schmid, J. H.; Ma, R.; Bedard, D.; Janz, S.; Xu, D.-X.; Densmore, A.; Lapointe, J.; Molina-Fernández, Í. We demonstrate a fully etched, continuously apodized fiber-to-chip surface grating coupler for the first time (to our knowledge). The device is fabricated in a single-etch step and operates with TM-polarized light, achieving a coupling efficiency of 3:7 dB and a 3 dB bandwidth of 60 nm. A subwavelength microstructure is employed to generate an effective medium engineered to vary the strength of the grating and thereby maximize coupling efficiency, while mitigating backreflections at the same time. Minimum feature size is 100 nm for compatibility with deep-UV 193 nm lithography.