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A SnOx/Au/SnOx transparent conductive oxide (TCO) multilayered film was fabricated with a total thickness of 75 nm using both e-beam and thermal evaporation techniques.

Potentiodynamic polarization studies were carried out on amorphous, nanocrystalline and crystalline states of the alloy Ti60Ni40 in 0.1 M HNO3, 0.5 M HNO3 and 1 M HNO3 aqueous solutions at room temperature. It was observed that the amorphous state exhibited higher corrosion current density than that by the nanocrystalline state. These results are corroborated by the weight loss studies performed on the different structural states of Ti60Ni40 alloy in 0.1 M HNO3, 0.5 M HNO3 and 1 M HNO3 aqueous media. Thus the nanocrystalline state is least prone to corrosion than the amorphous and the crystalline states.

Higher resolution can be achieved in lithography by decreasing the wavelength of the exposure source. However, resist material and their processing are also important when we move to a shorter wavelength lithography technology. This paper reviews the recent development and challenges of deep-UV photoresists and their processing technology.