Four tunnel junction (TJ) designs for multijunction (MJ) solar cells under high concentration are studied to determine the peak tunnelling current and resistance change as a function of the doping concentration. These four TJ designs are: AlGaAs/AlGaAs, GaAs/GaAs, AlGaAs/InGaP and AlGaAs/GaAs. Time‐dependent and time‐average methods are used to experimentally characterize the entire current–voltage profile of TJ mesa structures. Experimentally calibrated numerical models are used to determine the minimum doping concentration required for each TJ design to operate within a MJ solar cell up to 2000‐suns concentration. The AlGaAs/GaAs TJ design is found to require the least doping concentration to reach a resistance of <10−4 Ω cm2 followed by the GaAs/GaAs TJ and finally the AlGaAs/AlGaAs TJ. The AlGaAs/InGaP TJ is only able to obtain resistances of ≥5 × 10−4 Ω cm2 within the range of doping concentrations studied. Copyright © 2010 John Wiley & Sons, Ltd.

Optical to electrical power converting semiconductor devices were achieved with breakthrough performance by designing a Vertical Epitaxial Heterostructure Architecture. The devices are featuring modeled and measured conversion efficiencies greater than 65%. The ultrahigh conversion efficiencies were obtained by monolithically integrating several thin GaAs photovoltaic junctions tailored with submicron absorption thicknesses and grown in a single crystal by epitaxy. The heterostructures that were engineered with a number N of such ultrathin junctions yielded an optimal external quantum efficiencies approaching 100%/N. The heterostructures are capable of output voltages that are multiple times larger than the corresponding photovoltage of the input light. The individual nanoscale junctions are each generating up to ∼1.2 V of output voltage when illuminated in the infrared. We compare the optoelectronic properties of phototransducers prepared with designs having 5 to 12 junctions and that are exhibiting voltage outputs between &gt;5 V and &gt;14 V.

Photovoltaic power converting III–V semiconductor devices based on the Vertical Epitaxial HeteroStructure Architecture (VEHSA) design have been achieved with up to 20 thin p/n junctions (PT20). Open circuit photovoltages in excess of 23 V are measured for a continuous wave monochromatic optical input power of ∼1 W tuned in the 750 nm–875 nm wavelength range. Conversion efficiencies greater than 60% are demonstrated when the PT20 devices are measured near the peak of their spectral response. Noticeably, the PT20 structure is implemented with its narrowest ultrathin base having a thickness of only 24 nm. In the present study, the spectral response of the PT20 peaks at external quantum efficiency (EQE) of 89%/20 for an input wavelength of 841 nm. We also performed a detailed analysis of the EQE dependence with temperature and for VEHSA structures realised with a varied number of p/n junctions. The systematic study reveals the correlations between the measured conversion efficiencies, the EQE behavior, and the small deviations in the implementation of the optimal designs. Furthermore, we modeled the photovoltage performance of devices designed with thinner bases. For example, we derive that the narrowest subcell of a PT60 structure would have a base as thin as 8 nm, it is expected to still generate an individual subcell photovoltage of 1.14 V, and it will begin to feature 2-dimensional quantum well effects.

Abstract:We report modal phase matched (MPM) second harmonic generation (SHG) in high-index contrast AlGaAs sub-micron ridge waveguides, by way of sub-mW continuous wave powers at telecommunication wavelengths. We achieve an experimental normalized conversion efficiency of ~14%/W/cm 2 , obtained through a careful subwavelength design supporting both the phase matching requirement and a significant overlap efficiency. Furthermore, the weak anomalous dispersion, robust fabrication technology and possible geometrical and thermal tuning of the device functionality enable a fully integrated multi-functional chip for several critical areas in telecommunications, including wavelength (time) division multiplexing and quantum entanglement. 2974-2976 (2004). 15. S. V. Rao, K. Moutzouris, and M. Ebrahimzadeh, "Nonlinear frequency conversion in semiconductor optical waveguides using birefringent, modal and quasi-phase-matching techniques," J. Opt. A, Pure Appl. Opt. 6(6), 569-584 (2004). 16. Y. Ishigame, T. Suhara, and H. Nishihara, "LiNbO(3) waveguide second-harmonic-generation device phase matched with a fan-out domain-inverted grating," Opt. Lett. 16(6), 375-377 (1991). 17. X. Yu, L. Scaccabarozzi, J. S. Harris Jr, P. S. Kuo, and M. M. Fejer, "Efficient continuous wave second harmonic generation pumped at 1.55 μm in quasi-phasematched AlGaAs waveguides," Opt. Express 13, 10742-10748 (2005). 18. A. Fiore, S. Janz, L. Delobel, P. van der Meer, P. Bravetti, V. Berger, E. Rosencher, and J. Nagle, "Secondharmonic generation at λ = 1.6 μm in AlGaAs/Al2O3 waveguides using birefringence phase matching," Appl. tuning and tolerances," IEEE J. Quantum Electron. 28(11), 2631-2654 (1992). 22. P. Abolghasem, J. Han, B. J. Bijlani, A. Arjmand, and A. S. Helmy, "Highly efficient second-harmonic generation in monolithic matching layer enhanced AlxGa1-xAs Bragg reflection waveguides," IEEE Photon. ©2011 Optical Society of America

Semiconductor nanowaveguides are the key structure for light-guiding nanophotonics applications. Efficient guiding and confinement of single-mode light in these waveguides require high aspect ratio geometries. In these conditions, sidewall verticality becomes crucial. We fabricated such structures using a top-down process combining electron beam lithography and inductively coupled plasma (ICP) etching of hard masks and GaAs/AlGaAs semiconductors with Al concentrations varying from 0 to 100%. The GaAs/AlGaAs plasma etching was a single-step process using a Cl(2)/BCl(3)/Ar gas mixture with various fractions of N(2). Scanning electron microscope (SEM) observations showed that the presence of nitrogen generated the deposition of a passivation layer, which had a significant effect on sidewall slope. Near-ideal vertical sidewalls were obtained over a very narrow range of N(2), allowing the production of extremely high aspect ratios (>32) for 80 nm wide nanowaveguides.