Here, we report 3D hierarchical SnO nanowire (NW) core-amorphous silicon shell on free-standing carbon nanotube paper (SnO@a-Si/CNT paper) as an effective anode for flexible lithium-ion battery (LIB) application. This binder-free electrode exhibits a high initial discharge capacity of 3020 mAh g with a large reversible charge capacity of 1250 mAh g at a current density of 250 mA g. Compared to other SnO NW or its core-shell nanostructured anodes, the fabricated SnO@a-Si/CNT structure demonstrates an outstanding performance with high mass loading (∼5.9 mg cm), high areal capacity (∼5.2 mAh cm), and large volumetric capacity (∼1750 mAh cm) after 25 cycles. Due to the incorporation of CNT paper as the current collector, the weight and thickness of the total electrode is effectively reduced with respect to the conventional LIB anodes. The fabricated electrode has a total thickness of only 30 μm and considering the total weight of the electrode (active mass + current collector), an initial discharge/charge capacity of 2460/1018 mAh g is obtained. Hence, this thin, lightweight and highly flexible structure is proposed as an excellent candidate for high-performance LIB anode materials, especially in flexible electronics.
We report on the hydrogen-assisted deep reactive ion etching of hydrogenated amorphous silicon (a-Si:H) films deposited using radio-frequency plasma enhanced chemical vapor deposition (RF-PECVD). High aspect-ratio vertical and 3D amorphous silicon features, with the desired control over the shaping of the sidewalls, in micro and nano scales, were fabricated in ordered arrays. The suitable adhesion of amorphous Si film to the underlayer allows one to apply deep micro- and nano-machining to these layers. By means of a second deposition of amorphous silicon on highly curved 3D structures and subsequent etching, the fabrication of amorphous silicon rings is feasible. In addition to photolithography, nanosphere colloidal lithography and electron beam lithography were exploited to realize ultra-small features of amorphous silicon. We have also investigated the optical properties of fabricated hexagonally patterned a-Si nanowire arrays on glass substrates and demonstrated their high potential as active layers for solar cells. This etching process presents an inexpensive method for the formation of highly featured arrays of vertical and 3D amorphous silicon rods on both glass and silicon substrates, suitable for large-area applications.
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