Photocurable adhesives based on polymers and resins are an integral part of different production processes because of their fast curing and local area bonding ability. Recently, dismantlable adhesives have attracted a lot of attention for recycling adherends or replacement of adhesion defects. However, adhesives that allow repeatable bonding and debonding solely by light irradiation, i.e., without heat activation, are lacking. Here, ABA-type triblock copolymers consisting of poly(meth)acrylates bearing an azobenzene moiety (A block) and 2-ethylhexyl (B block) side chains were synthesized and utilized as photocurable adhesives. In contrast to the azo homopolymers, the block copolymer structure and incorporation of the soft middle block actualized a low concentration of the azobenzene moiety and consequently, higher flexibility of the resultant copolymers. This enabled film formation of the azobenzene-based adhesives and light-induced bonding for the first time. On the basis of the photoisomerization of the azobenzene moiety, changes in their viscoelastic property, i.e., softening and hardening, were induced by UV irradiation at 365 nm (50-100 mW cm) and green light irradiation at 520 nm (40 mW cm), respectively. In fact, two glass substrates were bonded with the self-standing polymer film, which was sequentially softened and hardened upon UV and green light irradiations. They exhibited shear strengths of 1.5-2.0 MPa, and UV irradiation lowered the adhesion strength to 0.5-0.1 MPa. Interestingly, the repeatable bonding and debonding abilities of the polymers were accomplished without loss of the adhesion strength.

We previously reported that ABA‐type triblock copolymers with azobenzene‐containing terminal blocks can be utilized as a light‐induced reworkable adhesive that enables repeatable bonding and debonding on demand. The reworkability was based on the photoisomerization of the azobenzene moiety and concomitant softening and hardening of the azo blocks. Our aim in this study is to investigate the effect of the composition, molecular weight, and block copolymer architectures on the reworkable adhesive properties. For this purpose, we prepared AB diblock, ABA triblock, and 4‐arm (AB)4 star‐block copolymers consisting of polymethacrylates bearing an azobenzene moiety (A block) and 2‐ethylhexyl (B block) side chains and performed adhesion tests by using these block copolymers. As a result, among the ABA block copolymers with varied compositions and molecular weights, the ABA triblock copolymers with an azo block content of about 50 wt % and relatively low molecular weight could achieve an appropriate balance between high adhesion strength and low residual adhesion strength upon UV irradiation. Furthermore, the 4‐arm star‐block structure not only enhances the adhesion strength, but also maintains low residual adhesion strength when exposed to UV irradiation. © 2019 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2019, 57, 806–813