In this present research work, TiZrN and TaZrN multilayer coating was deposited on 4140 steel by RF/DC magnetron sputtering for comparative work also prepared in single layer. The flow rate ratio of Ar/N2 was set to 15 : 3 sccm and the thin film was prepared by the PVD (physical vapor deposition) method by RF/DC magnetron using a Ti-Zr and Ta-Zr target with a purity of 99.99%. The crystal structure, surface morphology microstructure, and component arrangements were explored by X-ray diffraction (XRD), scanning electron microscope (SEM), and atomic force microscopy (AFM). It has been found that the crystal structure, surface morphology, microstructure, and elemental composition of the membrane are strongly dependent on deposition parameters. It is mechanically characterized by corrosion and Vickers hardness. In AFM measurements, coarse cluster particles with increasing Ti and Ta values not only increase the average roughness (Ra) by 2.341 nm (200°C) and 2.951 nm (400°C) but also have a continuous average thickness which was shown to increase by 1.504 nm and 781.75 nm. With the increase of hardness, the roughness decreases correspondingly. The TiZrN multilayer microhardness augmented to 314 GPa at 200°C and 371 GPa for TaZrN (400°C).
In this research work aluminum nitride (AlN) films were deposited usig only RF reactive sputtering atmossphere of nitrogen and argon on mild steel (AISI 1018). Coatings were deposited on substrates at RT, 200ºC, 400ºC, 500ºC and at 600ºC.The substrate temperatute notably affected the thichness, crystalline grain size, and hardness of the coatings. Use XRD, AFM, SEM, EDX, nanoindentation, salt spray or moisture to check the chemical composition, thickness, roughness, film structure, mechanical and corrosion properties of the film. All samples confirmed excessive hardness values exceeded in some cases, 23 Gpa and Elastic modulus 222 Gpa for 500ºC. AlN with a lattice (a=2.80710 Ǻ) parameter and only developed under conditions of high surface mobility.
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