The electrical properties of p-type Mg-doped GaN are investigated through variable-temperature Hall effect measurements. Samples with a range of Mg-doping concentrations were prepared by metalorganic chemical vapor phase deposition. A number of phenomena are observed as the dopant density is increased to the high values typically used in device applications: the effective acceptor energy depth decreases from 190 to 112 meV, impurity conduction at low temperature becomes more prominent, the compensation ratio increases, and the valence band mobility drops sharply. The measured doping efficiency drops in samples with Mg concentration above 2×1020 cm−3.

The hole-transport properties of Mg-doped AlGaN/GaN superlattices are carefully examined. Variable-temperature Hall-effect measurements indicate that the use of such superlattices enhances the average hole concentration at a temperature of 120 K by over five orders of magnitude compared to a bulk GaN film (the enhancement at room temperature is a factor of 9). An unusual modulation-doping scheme, which has been realized using molecular-beam epitaxy, has yielded high-hole-mobility superlattices and conclusively demonstrated the pivotal role of piezoelectric and spontaneous polarization in determining the band structure of the superlattices.

We present results of experimental and theoretical investigations of electron transport through stub-shaped waveguides or electron stub tuners ͑ESTs͒ in the ballistic regime. Measurements of the conductance G as a function of voltages, applied to different gates V i (iϭbottom, top, and side͒ of the device, show oscillations in the region of the first quantized plateau that we attribute to reflection resonances. The oscillations are rather regular and almost periodic when the height h of the EST cavity is small compared to its width. When h is increased, the oscillations become less regular and broad depressions in G appear. A theoretical analysis, which accounts for the electrostatic potential formed by the gates in the cavity region, and a numerical computation of the transmission probabilities successfully explains the experimental observations. An important finding for real devices, defined by surface Schottky gates, is that the resonance minima result from size quantization along the transport direction of the EST.

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Temperature dependent Hall effect, optical admittance spectroscopy, and optical absorption measurements of semi-insulating bulk 4H-SiC are reported. Both intentionally vanadium doped material and commercial grade semi-insulating material were investigated. The carrier concentration versus inverse temperature results from Hall effect measurements up to 1000 K indicated the samples were dominated by one of two deep levels near midgap. In addition to the deep donor level of substitutional vanadium, E c Ϫ1.6 eV, we observed another level at E c Ϫ1.1 eV in some samples, indicating that levels other than the vanadium donor can pin the Fermi level in semi-insulating SiC. Optical admittance measurements on the semi-insulating material indicate the presence of levels at E c Ϫ1.73 and 1.18 eV that were previously observed in conducting samples with this technique and we attribute these levels to the same defects producing the 1.1 and 1.6 eV levels seen by Hall effect. Secondary ion mass spectroscopy measurements of dopant and impurity concentrations are reported. Even though vanadium is present in all of these samples, along with other impurities we are at present unable to definitively identify the 1.1 eV level.