An in situ x-ray reflectivity study of the dynamic evolution of a growing interface was carried out for gold sputter-deposited onto a polished silicon substrate. X-ray reflectivity data were recorded during growth for thicknesses of the gold film ranging from 50 to 3500 A. A progressive kinetic roughening of the gold-vacuum interface was observed and the time-dependent interfacial width exhibits a power-law behavior. Aided by scanning-tunneling-microscopy measurements the scaling exponents were determined and compared with theoretical studies.
We have carried out x-ray reflectivity and adsorption measurements on thermally evaporated silver and gold films deposited onto substrates held at 80, 300, and 500 K to investigate whether the surfaces of such films are fractal in nature. Both techniques indicate self-affine fractal scaling for Ag films deposited at near-normal incidence onto substrates held at 80 K.
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