Liquid phase deposition treatment (LPD) was applied to form a corrosion protective titanium dioxide (TiO 2 ) film on commercially available pure magnesium. Changing the solution pH, from acidic to highly alkaline, and with the addition of sucrose, it becomes possible to form a highly adhesive and thin TiO 2 film on commercially available pure magnesium without any heat treatment. The role of the sucrose may be attributed to the formation of tetrafluoroboric acid (BF 4 ) -in the solution reducing the homogeneous nucleation of TiO 2 in the LPD solution. The film formed in the weak alkaline environment shows better corrosion resistance than at other LPD conditions, while the average rest potential is the same as that of as-polished specimens. This low rest potential may be due to micro-cracks in the formed film and high activity of the magnesium substrate.
A process based on successive anodizing, liquid phase deposition (LPD), re-anodizing, and aluminium substrate dissolution to form alumina films with nano-dot structures is demonstrated. Initially, a protective oxide film is formed on the aluminium surface to prevent further dissolution of the aluminium substrate during LPD processing. Because of heterogeneity in the protective oxide film, localized dissolution would otherwise occur under the film, resulting in pit formation during the LPD treatment. During re-anodizing, these pits act as a mold for anodic oxide resembling a nano-dot like structure. Optimization of LPD parameters, such as time and temperature, would make it possible to obtain alumina films with nano-dot structures with sizes smaller than 1 mm. Alumina films with nano-dot structures with hollow can be realized by controlling the LPD conditions.
Liquid phase deposition (LPD) treatment and anodizing were used to form oxide layer for a high-capacitance aluminum electrolytic capacitor. Formation of protective oxide layers and modification of LPD conditions make it possible to prolong the LPD duration and lead to the formation of TiO 2 and NaF deposits on aluminum. A titanium oxide / aluminum oxide mixed layer was formed by a combination process of LPD treatment and anodizing. The capacitance of the formed layer was about 300% higher than that of an anodic oxide film formed on electropolished aluminum. The structures and compositions of the films that were formed were determined by transmission electron microscopy, scanning electron microscopy, and Rutherford backscattering spectroscopy.
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