We report on the realization of wide band gap (5–6 eV), single-phase, metastable, and epitaxial MgxZn1−xO thin-film alloys grown on sapphire by pulsed laser deposition. We found that the composition, structure, and band gaps of the MgxZn1−xO thin-film alloys depend critically on the growth temperature. The structural transition from hexagonal to cubic phase has been observed for (Mg content greater than 50 at. %) (1⩾x⩾0.5) which can be achieved by growing the film alloys in the temperature range of 750 °C to room temperature. Interestingly, the increase of Mg content in the film has been found to be beneficial for the epitaxial growth at relatively low growth temperature in spite of a large lattice mismatch between sapphire and cubic MgZnO alloys.

ZnO thin films have been grown heteroepitaxially on epi-GaN/sapphire (0001) substrates. Rutherford backscattering spectroscopy, ion channeling, and high resolution transmission electron microscopy studies revealed high-quality epitaxial growth of ZnO on GaN with an atomically sharp interface. The x-ray diffraction and ion channeling measurements indicate near perfect alignment of the ZnO epilayers on GaN as compared to those grown directly on sapphire (0001). Low-temperature cathodoluminescence studies also indicate high optical quality of these films presumably due to the close lattice match and stacking order between ZnO and GaN. Lattice-matched epitaxy and good luminescence properties of ZnO/GaN heterostructures are thus promising for ultraviolet lasers. These heterostructures demonstrate the feasibility of integrating hybrid ZnO/GaN optoelectronic devices.

Influence of oxygen pressure on the epitaxy, surface morphology, and optoelectronic properties has been studied in the case of ZnO thin films grown on sapphire (0001) by pulsed-laser deposition. Results of Rutherford backscattering and ion channeling in conjunction with atomic force microscopy clearly indicate that the growth mode, degree of epitaxy, and the defect density strongly depend on the oxygen background pressure during growth. It is also found that the growth mode and the defects strongly influence the electron mobility, free-electron concentration, and the luminescence properties of the ZnO films. By tuning the oxygen pressure during the initial and the final growth stages, smooth and epitaxial ZnO films with high optical quality, high electron mobility, and low background carrier concentration have been obtained. The implication of these results towards the fabrication of superlattices and controlled n- and p-type doping is discussed.

We report on the epitaxial growth of wide-band-gap cubic-phase MgxZn1−xO thin films on Si(100) by pulsed-laser deposition and fabrication of oxide-semiconductor-based ultraviolet photodetectors. The challenges of large lattice and thermal expansion mismatch between Si and MgxZn1−xO have been overcome by using a thin SrTiO3 buffer layer. The heteroepitaxy of cubic-phase MgxZn1−xO on Si was established with epitaxial relationship of MgxZn1−xO(100)//SrTiO3(100)//Si(100) and MgxZn1−xO[100]//SrTiO3[100]//Si[110]. The minimum yield of the Rutherford backscattering ion channeling in MgxZn1−xO layer was only 4%, indicating good crystalline quality of the film. Smooth surface morphology with rms roughness of 0.6 nm was observed using atomic force microscopy. Photodetectors fabricated on Mg0.68Zn0.32O/SrTiO3/Si show peak photoresponse at 225 nm, which is in the deep UV region.

We report on the fabrication and characterization of visible blind ultraviolet photodetectors based on MgxZn1−xO. Using pulsed laser deposition technique, Mg0.34Zn0.66O thin films with a bandgap of 4.05 eV were epitaxially grown on c-plane sapphire substrates. The structural, electrical, and optical properties of epilayers were characterized using various techniques. Based on the Mg0.34Zn0.66O films, planar geometry photconductive type metal–semiconductor–metal photodetectors were fabricated. At a 5 V bias, a high responsivity of 1200 A/W was achieved at 308 nm, and the visible rejection (R308 nm/R400 nm) was more than four orders of magnitude. The 10%–90% rise and fall time were 8 ns and 1.4 μs, respectively.

Large-scale wurtzite GaN nanowires and nanotubes were grown by direct reaction of metal gallium vapor with flowing ammonia in an 850–900 °C horizontal oven. The cylindrical structures were as long as 500 μm with diameters between 26 and ∼100 nm. Transmission electron microscopy, scanning electron microscopy, and x-ray diffraction were used to measure the size and structures of the samples. Preliminary results show that the size of the nanowires depends on the temperature and the NH3 flow rate. The growth mechanism is discussed briefly. The simple method presented here demonstrates that GaN nanowires can be grown without the use of a template or catalyst, as reported elsewhere.

We have fabricated Mg x Zn 1Ϫx O epitaxial composition spreads where the composition across the chip is linearly varied from ZnO to MgO. By using a scanning x-ray microdiffractometer and transmission electron microscopy, we have mapped the phase evolution across the spread. We have discovered a unique growth relationship between cubic and hexagonal Mg x Zn 1Ϫx O where their basal planes are coincident in the phase-separated region of the phase diagram where 0.37рx р0.6. The continuously changing band gap across the spread is used as a basis for compact broadband photodetector arrays with a range of detection wavelengths separately active at different locations on the spread film. The composition-spread photodetector is demonstrated in the wavelength range of 290-380 nm using the ZnO to Mg 0.4 Zn 0.6 O region of the spread.

We report on the structural, electrical, and optical properties of 5% niobium doped TiO2 thin films grown on various substrates by pulsed laser deposition. The epitaxial anatase Nb:TiO2 film on LaAlO3 is shown to be an intrinsic transparent metal and its metallic property arises from Nb substitution into Ti site as evidenced by the Rutherford backscattering channeling result. In contrast, the rutile Nb:TiO2 thin films show insulating behaviors with 2–3 orders higher room temperature electrical resistivity and ∼30 times lower mobility. A blueshift in the optical absorption edge is observed in both phases, though of differing magnitude.